The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon (μc-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) techn... by Jadkar, S.R, Sali, J.V, Takwale, M.G, Musale, D.V, Kshirsagar, S.T

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Influence of silane flow on structural, optical and electrical properties of a-Si:H thin films deposited by hot wire chemical vapor deposition (HW-CVD) technique by Jadkar, S.R., Sali, Jaydeep V., Musale, D.V., Kshirsagar, S.T., Takwale, M.G.

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Raman, photoluminescence and morphological studies of Si- and N-doped diamond films grown on Si(100) substrate by hot-filament chemical vapor deposition technique by Musale, D.V., Sainkar, S.R., Kshirsagar, S.T.

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Synthesis of highly conductive boron-doped p-type hydrogenated microcrystalline silicon (μc-Si:H) by a hot-wire chemical vapor deposition (HWCVD) technique by Jadkar, S.R, Sali, Jaydeep V, Takwale, M.G, Musale, D.V, Kshirsagar, S.T

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Properties of diamond films grown from CH 4CF 4H 2 gas mixture using the hot-filament chemical vapor deposition technique by Musale, D.V, Pavaskar, N.R, Kshirsagar, S.T

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Properties of diamond films grown from CH4CF4H2 gas mixture using the hot-filament chemical vapor deposition technique by Musale, D.V, Pavaskar, N.R, Kshirsagar, S.T

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Effect of coupling of radio-frequency plasma on the growth of diamond films in a hot filament reactor by Pai, M.P., Musale, D.V., Kshirsagar, S.T., Mitra, A., Sainkar, S.R.

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Low-pressure chemical vapour deposition of diamond films in a radio-frequency-plasma-assisted hot-filament reactor by Pai, M.P., Musale, D.V., Kshirsagar, S.T.

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Enhancement of nucleation and growth of diamond films using In–Sn–O buffer layer on Si substrate by Musale, D.V, Pai, M.P, Sainkar, S.R, Kshirsagar, S.T

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