Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices by NAHAR, R. K, SINGH, Vikram, SHARMA, Aparna

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Study of rapid thermal annealing on ultra thin high-k HfO2 films properties for nano scaled MOSFET technology by SINGH, Vikram, SHARMA, Satinder K, KUMAR, Dinesh, NAHAR, R. K

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Study of hafnium oxide deposited using Dense Plasma Focus machine for film structure and electrical properties as a MOS device by Srivastava, A., Nahar, R.K., Sarkar, C.K., Singh, W.P., Malhotra, Y.

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Study of the effect of thermal annealing on high k hafnium oxide thin film structure and electrical properties of MOS and MIM devices by Srivastava, A., Nahar, R. K., Sarkar, C. K.

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Improved thermal stability of nitrogen annealed sputtered hafnium oxide thin films for VLSI technology by Nahar, R.K, Singh, Vikram

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Study of electrical and micro-structural properties of high-κ gate dielectric stacks deposited using pulse laser deposition for MOS capacitor applications by Srivastava, A., Mangla, O., Nahar, R. K., Gupta, V., Sarkar, C. K.

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Study of the effect of substrate bias on the electrical properties of sputtered HfO2 thin film deposited on silicon substrate by Nahar, R.K, Sharma, Aparna

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Effects of heavy-ion irradiation on the electrical properties of rf-sputtered HfO2 thin films for advanced CMOS devices by Singh, Vikram, Shashank, N., Kumar, Dinesh, Nahar, R. K.

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Carrier-transfer mechanisms and Al2O3 sensors for low and high humidities by Khanna, V K, Nahar, R K

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Study of electrical and micro-structural properties of high-[kappa] gate dielectric stacks deposited using pulse laser deposition for MOS capacitor applications by Srivastava, A, Mangla, O, Nahar, R K, Gupta, V, Sarkar, C K

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Study of the performance degradation of thin film aluminum oxide sensor at high humidity by Nahar, R.K.

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Effects of heavy-ion irradiation on the electrical properties of rf-sputtered HfO 2 thin films for advanced CMOS devices by Singh, Vikram, Shashank, N., Kumar, Dinesh, Nahar, R. K.

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Effect of Si on the reaction kinetics of Ti/AlSi bilayer structures by NAHAR, R. K, DEVASHRAYEE, N. M

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Physical understanding of moisture induced degradation of nanoporous aluminum oxide thin films by Nahar, R. K.

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Improvement in narrow channel effect by an alternative isolation technology by ANDHARE, P. N., NAHAR, R. K., CHANDRA, S.

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On the origin of the humidity-sensitive electrical properties of porous aluminium oxide (sensor application) by Nahar, R K, Khanna, V K, Khokle, W S

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Frequency dependence studies on the interface trap density and series resistance of HfO2 gate dielectric deposited on Si substrate: Before and after 50<ce:hsp sp="0.25"/>MeV Li3+ i... by Singh, Vikram, Shashank, N, Sharma, Satinder K, Shekhawat, R S, Kumar, Dinesh, Nahar, R K

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A study of capacitance and resistance characteristics of an Al2O3 humidity sensor by NAHAR, R. K., KHANNA, V. K.

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Surface conduction mechanisms and the electrical properties of Al2O3 humidity sensor by Khanna, V.K., Nahar, R.K.

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On the specular reflectivity of rf sputtered AlSi alloy thin films by Nahar, R.K., Devashrayee, N.M.

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