Optical characterization of YBa2Cu3O7−δ thin film modified gold nanoparticles by Naujok, P., Katzer, C., Schmidl, G., Jatschka, J., Fritzsche, W., Schmidl, F.

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Thermal stability of B-based multilayer mirrors for next generation lithography by Naujok, P., Murray, K., Yulin, S., Patzig, C., Kaiser, N., Tünnermann, A.

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Optical characterization of YBa2Cu3O7− thin film modified gold nanoparticles by Naujok, P., Katzer, C., Schmidl, G., Jatschka, J., Fritzsche, W., Schmidl, F.

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The association between TMAO, CMPF, and clinical outcomes in advanced chronic kidney disease: results from the European QUALity (EQUAL) Study by Dai, Lu, Massy, Ziad A, Stenvinkel, Peter, Chesnaye, Nicholas C, Larabi, Islam Amine, Alvarez, Jean Claude, Caskey, Fergus J, Torino, Claudia, Porto, Gaetana, Szymczak, Maciej, Krajewska, Magdalena, Drechsler, Christiane, Wanner, Christoph, Jager, Kitty J, Dekker, Friedo W, Evenepoel, Pieter, Evans, Marie

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Clinical and patient-reported trajectories at end-of-life in older patients with advanced CKD by Chesnaye, Nicholas C, Caskey, Fergus J, Dekker, Friedo W, de Rooij, Esther N M, Evans, Marie, Heimburger, Olof, Pippias, Maria, Torino, Claudia, Porto, Gaetana, Szymczak, Maciej, Drechsler, Christiane, Wanner, Christoph, Jager, Kitty J

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Uraemic symptom burden and clinical condition in women and men of ≥65 years of age with advanced chronic kidney disease: results from the EQUAL study by van de Luijtgaarden, Moniek W M, Caskey, Fergus J, Wanner, Christoph, Chesnaye, Nicholas C, Postorino, Maurizio, Janmaat, Cynthia J, Rao, Anirudh, Torino, Claudia, Klinger, Marian, Drechsler, Christiane, Heimburger, Olof, Szymczak, Maciej, Evans, Marie, Dekker, Friedo W, Jager, Kitty J

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Investigation of CVD SiCOH low-k time-dependent dielectric breakdown at 65nm node technology by Chen, F., Chanda, K., Gill, J., Angyal, M., Demarest, J., Sullivan, T., Kontra, R., Shinosky, M., Li, J., Economikos, L., Hoinkis, M., Lane, S., McHerron, D., Inohara, M., Boettcher, S., Dunn, D., Fukasawa, M., Zhang, B.C., Ida, K., Ema, T., Lembach, G., Kumar, K., Lin, Y., Maynard, H., Urata, K., Bolom, T., Inoue, K., Smith, J., Ishikawa, Y., Naujok, M., Ong, P., Sakamoto, A., Hunt, D., Aitken, J.

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Integrated electro-chemical mechanical planarization (Ecmp) for future generation device technology by Economikos, L., Wang, X., Sakamoto, X., Ong, P., Naujok, M., Knarr, R., Chen, L., Moon, Y., Neo, S., Salfelder, J., Duboust, A., Manens, A., Lu, W., Shrauti, S., Liu, F., Tsai, S., Swart, W.

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65nm cmos technology for low power applications by Steegen, A., Mo, R., Mann, R., Sun, M.-C., Eller, M., Leake, G., Vietzke, D., Tilke, A., Guarin, F., Fischer, A., Pompl, T., Massey, G., Vayshenker, A., Tan, W.L., Ebert, A., Lin, W., Gao, W., Lian, J., Kim, J.-P., Wrschka, P., Yang, J.-H., Ajmera, A., Knoefler, R., Teh, Y.-W., Jamin, F., Park, J.E., Hooper, K., Griffin, C., Nguyen, P., Klee, V., Ku, V., Baiocco, C., Johnson, G., Tai, L., Benedict, J., Scheer, S., Zhuang, H., Ramanchandran, V., Matusiewicz, G., Lin, Y.-H., Siew, Y.K., Zhang, F., Leong, L.S., Liew, S.L., Park, K.C., Lee, K.-W., Hong, D.H., Choi, S.-M., Kaltalioglu, E., Kim, S.O., Naujok, M., Sherony, M., Cowley, A., Thomas, A., Sudijohno, J., Schiml, T., Ku, J.-H., Yang, I.

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