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59.9 mV·dec Subthreshold Swing Achieved in Zinc Tin Oxide TFTs With In Situ Atomic Layer Deposited AlO Gate Insulator
by
Newsom, Tonglin L.
,
Allemang, Christopher R.
,
Cho, Tae H.
,
Dasgupta, Neil P.
,
Peterson, Rebecca L.
Published in
IEEE electron device letters
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59.9 mV∙dec-1 Subthreshold Swing Achieved in Zinc Tin Oxide TFTs with in situ Atomic Layer Deposited Al2O3 Gate Insulator
by
Newsom, Tonglin L.
,
Allemang, Christopher R.
,
Cho, Tae H.
,
Dasgupta, Neil P.
,
Peterson, Rebecca L.
Published in
IEEE electron device letters
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Ieee Electron Device Letters
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Amorphous Semiconductors
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Semiconductor-Insulator Interfaces
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Thin Film Transistors
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Dielectrics
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Engineering, Electrical & Electronic
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Insulators
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Logic Gates
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Semiconductor Device Measurement
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Tin Oxides
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Zinc
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