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High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining
by
FRITSCHI, R
,
FREDERICO, S
,
CURTY, J.-P
,
DEHOLLAIN, C
,
DECLERCQ, M
,
IONESCU, A. M
,
HIBERT, C
,
FLÜCKIGER, Ph
,
RENAUD, Ph
,
TSAMADOS, D
,
BOUSSEY, J
,
CHOVET, A
,
NG, R. K. M
,
UDREA, F
Published in
Microelectronic engineering
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High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining
by
Fritschi, R.
,
Frédérico, S.
,
Hibert, C.
,
Flückiger, Ph
,
Renaud, Ph
,
Tsamados, D.
,
Boussey, J.
,
Chovet, A.
,
Ng, R.K.M.
,
Udrea, F.
,
Curty, J.-P.
,
Dehollain, C.
,
Declercq, M.
,
Ionescu, A.M.
Published in
Microelectronic engineering
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A new cell-based performance metric for novel CMOS device architectures
by
Christie, P.
,
Heringa, A.
,
Doornbos, G.
,
Kumar, A.
,
Nguyen, V.H.
,
Ng, R.K.M.
,
Garg, M.
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An integrative approach to product development—A skin-care cream
by
Cheng, Yuen S.
,
Lam, Ka W.
,
Ng, Ka M.
,
Ko, Robert K.M.
,
Wibowo, Christianto
Published in
Computers & chemical engineering
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