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Search Results - Ngoo, Yi Jie
Search Results - Ngoo, Yi Jie
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Low thermal budget Hf/Al/Ta ohmic contacts for InAlN/GaN-on-Si HEMTs with enhanced breakdown voltage
by
Liu, Yi
,
Singh, Sarab Preet
,
Ngoo, Yi Jie
,
Kyaw, Lwin Min
,
Bera, Milan Kumar
,
Lo, Quo Qiang
,
Chor, Eng Fong
Published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Influence of PECVD deposited SiNx passivation layer thickness on In0.18Al0.82N/GaN/Si HEMT
by
Singh, Sarab Preet
,
Liu, Yi
,
Ngoo, Yi Jie
,
Kyaw, Lwin Min
,
Bera, Milan Kumar
,
Dolmanan, S B
,
Tripathy, Sudhiranjan
,
Chor, Eng Fong
Published in
Journal of physics. D, Applied physics
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Influence of PECVD deposited SiN x passivation layer thickness on In 0.18 Al 0.82 N/GaN/Si HEMT
by
Singh, Sarab Preet
,
Liu, Yi
,
Ngoo, Yi Jie
,
Kyaw, Lwin Min
,
Bera, Milan Kumar
,
Dolmanan, S B
,
Tripathy, Sudhiranjan
,
Chor, Eng Fong
Published in
Journal of physics. D, Applied physics
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Influence of PECVD deposited SiN sub(x) passivation layer thickness on In sub(0.18)Al sub(0.82)N/GaN/Si HEMT
by
Singh, Sarab Preet
,
Liu, Yi
,
Ngoo, Yi Jie
,
Kyaw, Lwin Min
,
Bera, Milan Kumar
,
Dolmanan, S B
,
Tripathy, Sudhiranjan
,
Chor, Eng Fong
Published in
Journal of physics. D, Applied physics
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Thickness Dependent Electrical Characteristics of InAlN/GaN-On-Si MOSHEMTs with Y 2 O 3 Gate Dielectric and Au-Free Ohmic Contact
by
Bera, Milan Kumar
,
Liu, Yi
,
Kyaw, Lwin Min
,
Ngoo, Yi Jie
,
Chor, Eng Fong
Published in
ECS transactions
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Fabrication and Performance of InAlN/GaN-on-Si MOSHEMTs with LaAlO 3 Gate Dielectric Using Gate-First CMOS Compatible Process at Low Thermal Budget
by
Bera, Milan Kumar
,
Liu, Yi
,
Kyaw, Lwin Min
,
Ngoo, Yi Jie
,
Singh, Sarab Preet
,
Chor, Eng Fong
Published in
ECS transactions
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Low Thermal Budget Au-Free Hf-Based Ohmic Contacts on InAlN/GaN Heterostructures
by
Liu, Yi
,
Kyaw, Lwin Min
,
Bera, Milan Kumar
,
Singh, Sarab Preet
,
Ngoo, Yi Jie
,
Lo, Guo Qiang
,
Chor, Eng Fong
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Fabrication and Performance of InAlN/GaN-on-Si MOSHEMTs with LaAlO3 Gate Dielectric Using Gate-First CMOS Compatible Process at Low Thermal Budget
by
Bera, Milan Kumar
,
Liu, Yi
,
Kyaw, Lwin Min
,
Ngoo, Yi Jie
,
Singh, Sarab Preet
,
Chor, Eng Fong
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Gold-Free InAlN/GaN Schottky Gate HEMT On Si (111) Substrate with ZrO 2 Passivation
by
Kyaw, Lwin Min
,
Liu, Yi
,
Bera, Milan Kumar
,
Ngoo, Yi Jie
,
Tripathy, Sudhiranjan
,
Chor, Eng Fong
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Silicon Nitride Thickness Dependent Electrical Properties of InAlN/GaN Heterostructures
by
Singh, Sarab Preet
,
Liu, Yi
,
Kyaw, Lwin Min
,
Ngoo, Yi Jie
,
Bera, Milan Kumar
,
Dolmanan, Surani Bin
,
Tripathy, Sudhiranjan
,
Chor, Eng Fong
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