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Development of Direct Deep Reactive Ion Etching Process Using Laser Interference Lithographed Etch Barrier without Intermediate Layer
by
Je, Soonkyu
,
Shim, Jongmyeong
,
Kim, Joongeok
,
Kim, Minsoo
,
Lee, Jinhyung
,
Nho, Heejin
,
Han, Jungjin
,
Kim, Seok-min
,
Kang, Shinill
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Japanese Journal of Applied Physics
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Japanese Journal Of Applied Physics
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Jpn J Appl Phys
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Barriers
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Etching
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General Engineering
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General Physics And Astronomy
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High Aspect Ratio
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Lasers
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Nanostructure
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Physical Sciences
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Physics
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Physics, Applied
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Reactive Ion Etching
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Science & Technology
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Silicon
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Simulation
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Institute Of Physics Iop Science Extra
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