Search Results - Nishihashi, T

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  1. 1
    Application of Stencil Mask Ion Implantation Technology to Power Semiconductors

    Application of Stencil Mask Ion Implantation Technology to Power Semiconductors by Nishiwaki, T, Saito, H, Hamada, K, Tonari, K, Nishihashi, T

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  2. 2
    Stencil mask ion implantation technology

    Stencil mask ion implantation technology by Shibata, T., Suguro, K., Sugihara, K., Nishihashi, T., Fujiyama, J., Sakurada, Y.

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  3. 3
    Prevention of Neutrophil-Mediated Hepatic Ischemia/Reperfusion Injury by Superoxide Dismutase and Catalase Derivatives

    Prevention of Neutrophil-Mediated Hepatic Ischemia/Reperfusion Injury by Superoxide Dismutase and Catalase Derivatives by Yabe, Y, Kobayashi, N, Nishihashi, T, Takahashi, R, Nishikawa, M, Takakura, Y, Hashida, M

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  4. 4
    Lithographyless ion implantation technology for agile fab

    Lithographyless ion implantation technology for agile fab by Nishihashi, T., Kashimoto, K., Fujiyama, J., Sakurada, Y., Shibata, T., Suguro, K., Sugihara, K., Okumura, K., Gotou, T., Saji, N., Tsunoda, M.

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  5. 5
    Enhanced reactivity to vasopressin in rat basilar arteries during vasospasm after subarachnoid hemorrhage

    Enhanced reactivity to vasopressin in rat basilar arteries during vasospasm after subarachnoid hemorrhage by Nishihashi, Tsuyoshi, Trandafir, Cristina C., Wang, Aimin, Ji, Xu, Kurahashi, Kazuyoshi

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  6. 6
    PARTICIPATION OF VASOPRESSIN IN THE DEVELOPMENT OF CEREBRAL VASOSPASM IN A RAT MODEL OF SUBARACHNOID HAEMORRHAGE

    PARTICIPATION OF VASOPRESSIN IN THE DEVELOPMENT OF CEREBRAL VASOSPASM IN A RAT MODEL OF SUBARACHNOID HAEMORRHAGE by Trandafir, Cristina C, Nishihashi, Tsuyoshi, Wang, Aimin, Murakami, Shizuka, Ji, Xu, Kurahashi, Kazuyoshi

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  7. 7
    Hypersensitivity to Hydroxyl Radicals in Rat Basilar Artery After Subarachnoid Hemorrhage

    Hypersensitivity to Hydroxyl Radicals in Rat Basilar Artery After Subarachnoid Hemorrhage by Nishihashi, Tsuyoshi, Trandafir, Cristina C., Wang, Aimin, Ji, Xu, Shimizu, Yoshiharu, Kurahashi, Kazuyoshi

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  8. 8
    Lithography-less ion implantation technology for agile fab

    Lithography-less ion implantation technology for agile fab by Shibata, T., Sugoruo, K., Sughihara, K., Okumura, K., Nishihashi, T., Kashimoto, K., Fujiyama, J., Sakurada, Y., Gorou, T., Saji, N., Tsunoda, M.

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  9. 9
    Cysteinyl leukotrienes and leukotriene B 4 mediate vasoconstriction to arginine vasopressin in rat basilar artery

    Cysteinyl leukotrienes and leukotriene B 4 mediate vasoconstriction to arginine vasopressin in rat basilar artery by Trandafir, Cristina C, Nishihashi, Tsuyoshi, Ji, Xu, Wang, Aimin, Kurahashi, Kazuyoshi

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  10. 10
    INVOLVEMENT OF ENDOTHELIAL CYCLO-OXYGENASE METABOLITES IN NORADRENALINE-INDUCED CONTRACTION OF RAT CORONARY ARTERY

    INVOLVEMENT OF ENDOTHELIAL CYCLO-OXYGENASE METABOLITES IN NORADRENALINE-INDUCED CONTRACTION OF RAT CORONARY ARTERY by Wang, Aimin, Nishihashi, Tsuyoshi, Trandafir, Cristina C, Murakami, Shizuka, Ji, Xu, Shimizu, Yoshiharu, Kurahashi, Kazuyoshi

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  11. 11
    Stencil mask ion implantation technology for high performance MOSFETs

    Stencil mask ion implantation technology for high performance MOSFETs by Shibata, T., Suguro, K., Sugihara, K., Mizuno, H., Yagishita, A., Saito, T., Okumura, K., Nishihashi, T., Gotou, T., Tsunoda, M., Saji, S.

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  12. 12
    Ion-graphy implanter with stencil mask

    Ion-graphy implanter with stencil mask by Nishihashi, T., Kashimoto, K., Fujiyama, J., Sakurada, Y., Shibata, T., Suguro, K., Sugihara, K., Okumura, K., Gotou, T., Saji, S., Tsunoda, M.

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  13. 13
    Performance of IW-630 ion implanter for 300-mm wafers

    Performance of IW-630 ion implanter for 300-mm wafers by Nishihashi, T., Yokoo, H., Hisamune, T., Shimizu, T., Fukui, R., Suzuki, H., Kageyama, K., Niikura, K., Fuwa, K., Oka, T., Kashimoto, K., Fujiyama, J., Sakurada, Y.

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  14. 14
    Stencil mask ion implantation technology for sub 100 nm technology node

    Stencil mask ion implantation technology for sub 100 nm technology node by Shibata, T., Suguro, K., Sugihara, K., Nishihashi, T.

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  15. 15
    Ion optics of parallel scan implanter using two octupole deflectors

    Ion optics of parallel scan implanter using two octupole deflectors by Tsukakoshi, O., Niikura, I., Nishihashi, T., Mihara, Y., Sakurada, Y.

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  16. 16
    Development of cryopump for ion implantation equipment

    Development of cryopump for ion implantation equipment by Furuya, S., Terashima, M., Morimoto, H., Nishihashi, T., Kashimoto, K., Sakurada, Y.

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  17. 17
    A new developed in-line dose monitor

    A new developed in-line dose monitor by Hisamune, T., Niikura, K., Kimura, N., Yokoo, H., Nishihashi, T., Kashimoto, K., Samurada, Y., Kitamura, T., Takeshita, M., Yajima, T., Yasaka, M.

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  18. 18
    The core ion implanter for 300-mm wafers: IW-630

    The core ion implanter for 300-mm wafers: IW-630 by Nishihashi, T., Yokoo, H., Hisamune, T., Sakuishi, T., Kimura, N., Niikura, K., Ishiwatari, S., Fukui, R., Tomita, M., Shimizu, T., Miyaya, T., Iwase, Y., Kunibe, T., Ogata, S., Fuwa, K., Kashimoto, K., Fujiyama, J., Sakurada, Y.

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  19. 19
    Microstructures and mechanical properties of reactively sintered CaAl12O19/CaAl4O7 porous composites

    Microstructures and mechanical properties of reactively sintered CaAl12O19/CaAl4O7 porous composites by Suzuki, Yoshikazu, Nishihashi, Kanako

    Published in Ceramics international
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  20. 20
    Structural and Magnetic Properties of Dimeric Capsule Assemblies Formed by Cyclic Trinuclear Complexes

    Structural and Magnetic Properties of Dimeric Capsule Assemblies Formed by Cyclic Trinuclear Complexes by Muto, Masahiro, Morinaga, Kousuke, Nishihashi, Momoko, Yamada, Yasunori, Koikawa, Masayuki

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