Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography by Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Francis M, Novembre, Anthony E

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New Developments in Resist Materials for the SCALPEL Technology by Novembre, Anthony E., Ocola, Leonidas E., Houlihan, Frank, Knurek, Chester, Blakey, Myrtle

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Capabilities and Limitations of Plasma Polymerized Methylsilane (PPMS) All-Dry Lithography by Dabbagh, Gary, Hutton, Richard S., Cirelli, Raymond A., Novembre, Anthony E., Reichmanis, Elsa, Nalamasu, Omkaram

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RESIST DESIGN CONSIDERATIONS FOR DIRECT WRITE AND PROJECTION ELECTRON-BEAM LITHOGRAPHY TECHNOLOGIES by Novembre, Anthony E., Tarascon, Regine G., Berger, Steven D., Biddick, Chris J., Blakey, Myrtle I., Bolan, Kevin J., Fetter, Linus A., Harriott, Lloyd R., Huggins, Harold A., Knurek, Chester S., Liddle, J. Alexander, Mixon, David A., Peabody, Milton L.

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SCALPEL mask defect imaging analysis by Stanton, Stuart T., Alexander Liddle, J., Novembre, Anthony E., Mkrtchyan, Masis M.

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t-BOC based resists: A polymeric platform for .LEQ.0.25.MU.m lithographic technologies by Nalamasu, Omakaram, Novembre, Anthony E., Kometani, Janet M., Hanson, James E.

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Near field optical latent imaging with the photon tunneling microscope by Marchman, Herschel M., Novembre, Anthony E.

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The electron-beam and x-ray lithographic performance of the high resolution CAMP and ARCH family of chemically amplified resists by Novembre, Anthony E., Münzel, Norbert

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High density submicron features using a laser pattern generator and double patterning by Gaevski, Mikhail E., Watson, G. Patrick, Novembre, Anthony E.

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193 nm lithography using a negative acting P(SI-CMS) resist by Smith, Bruce W., Novembre, Anthony E., Mixon, David A.

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The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system by LIDDLE, J. A, BERGER, S. D, CUSTY, J, FARROW, R. C, FELKER, J. A, FETTER, L. A, FREEMAN, B, HARRIOTT, L. R, HOPKINS, L.L, HUGGINS, H. A, KNUREK, C. S, KRAUS, J. S, BIDDICK, C. J, MIXON, D. A, MKRTCHYAN, M. M, NOVEMBRE, A. E, PEABODY, M. L, SIMPSON, W. M, TARASCON, R. G, WADE, H. H, WASKIEWICZ, W. K, WATSON, G. P, WILLIAMS, J. K, BLAKEY, M. I, WINDT, D. L, BOLAN, BOWLER, S. W, BRADY, K, CAMARDA, R. M, CONNELLY, W. F, CHORKEN, A

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t-BOC BASED RESISTS by Nalamasu, Omakaram, E. Novembre, Anthony, M. Kometani, Janet, E. Hanson, James

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t-BOC BASED RESISTS: A POLYMERIC PLATFORM FOR ≤ 0.25μm LITHOGRAPHIC TECHNOLOGIES by Nalamasu, Omakaram, Novembre, Anthony E., Kometani, Janet M., Hanson, James E.

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