Search Results - Oberemok, O.S.

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  1. 1
    Infrared study of the structure of silicon oxynitride films produced by plasma enhanced chemical vapor deposition

    Infrared study of the structure of silicon oxynitride films produced by plasma enhanced chemical vapor deposition by Lisovskyy, I.P., Voitovych, M.V., Sarikov, A.V., Zlobin, S.O., Lukianov, A.N., Oberemok, O.S., Dubikovsky, O.V.

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  2. 2
    Structural and optical studies of strain relaxation in Ge1−xSnx layers grown on Ge/Si(001) by molecular beam epitaxy

    Structural and optical studies of strain relaxation in Ge1−xSnx layers grown on Ge/Si(001) by molecular beam epitaxy by Nikolenko, A.S., Strelchuk, V.V., Safriuk, N.V., Kryvyi, S.B., Kladko, V.P., Oberemok, O.S., Borkovska, L.V., Sadofyev, Yu.G.

    Published in Thin solid films
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    Growth of silicon self-assembled nanowires by using gold-enhanced CVD technology

    Growth of silicon self-assembled nanowires by using gold-enhanced CVD technology by Klimovskaya, A. I.

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  4. 4
    Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film

    Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film by Oberemok, O.S.

    Published in Functional materials
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