Search Results - Orji, Ndubuisi G.

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  1. 1
    Scanning probe microscope dimensional metrology at NIST

    Scanning probe microscope dimensional metrology at NIST by Kramar, John A, Dixson, Ronald, Orji, Ndubuisi G

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  2. 2
    How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning

    How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning by Neisser, Mark, Orji, Ndubuisi G., Levinson, Harry J., Celano, Umberto, Moyne, James, Mashiro, Supika, Wilcox, Dan, Libman, Slava

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  3. 3
    Tip characterization method using multi-feature characterizer for CD-AFM

    Tip characterization method using multi-feature characterizer for CD-AFM by Orji, Ndubuisi G., Itoh, Hiroshi, Wang, Chumei, Dixson, Ronald G., Walecki, Peter S., Schmidt, Sebastian W., Irmer, Bernd

    Published in Ultramicroscopy
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  4. 4
    Line edge roughness metrology using atomic force microscopes

    Line edge roughness metrology using atomic force microscopes by Orji, Ndubuisi G, Vorburger, Theodore V, Fu, Joseph, Dixson, Ronald G, Nguyen, Cattien V, Raja, Jayaraman

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  5. 5
    Traceable pico-meter level step height metrology

    Traceable pico-meter level step height metrology by Orji, Ndubuisi G., Dixson, Ronald G., Fu, Joseph, Vorburger, Theodore V.

    Published in Wear
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  6. 6
    Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks

    Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks by Smith, S., Tsiamis, A., McCallum, M., Hourd, A.C., Stevenson, J.T.M., Walton, A.J., Dixson, R.G., Allen, R.A., Potzick, J.E., Cresswell, M.W., Orji, N.G.

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  7. 7
    Line edge roughness metrology using atomic force microscopes

    Line edge roughness metrology using atomic force microscopes by Orji, Ndubuisi G, Vorburger, Theodore V, Fu, Joseph, Dixson, Ronald G, Nguyen, Cattien V, Raja, Jayaraman

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  8. 8
    Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging

    Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging by Clarke, James S., Schmidt, Michael B., Orji, Ndubuisi G.

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  9. 9
    A Systematic Approach to Accurate Evaluation of CD-Metrology Tools

    A Systematic Approach to Accurate Evaluation of CD-Metrology Tools by Orji, N.G., Bunday, B.D., Dixson, R.G., Allgair, J.A.

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