Search Results - Oszinda, Thomas

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  1. 1
    Chemical Repair of Plasma Damaged Porous Ultra Low-κ SiOCH Film Using a Vapor Phase Process

    Chemical Repair of Plasma Damaged Porous Ultra Low-κ SiOCH Film Using a Vapor Phase Process by Oszinda, Thomas, Schaller, Matthias, Schulz, Stefan E.

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  2. 2
    How to evaluate surface free energies of dense and ultra low- κ dielectrics in pattern structures

    How to evaluate surface free energies of dense and ultra low- κ dielectrics in pattern structures by Oszinda, Thomas, Schaller, Matthias, Dittmar, Kornelia, Jiang, Le, Schulz, Stefan E.

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  3. 3
    Investigation of physical and chemical property changes of ultra low-κ SiOCH in aspect of cleaning and chemical repair processes

    Investigation of physical and chemical property changes of ultra low-κ SiOCH in aspect of cleaning and chemical repair processes by Oszinda, Thomas, Schaller, Matthias, Fischer, Daniel, Walsh, Christine, Schulz, Stefan E.

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  4. 4
    Chemical Repair of Plasma Damaged Porous Ultra Low-k SiOCH Film using a Vapor Phase Process

    Chemical Repair of Plasma Damaged Porous Ultra Low-k SiOCH Film using a Vapor Phase Process by Oszinda, Thomas, Schaller, Matthias, Schulz, Stefan E.

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  5. 5
    Improved characterization of Fourier transform infrared spectra analysis for post-etched ultra-low- κ SiOCH dielectric using chemometric methods

    Improved characterization of Fourier transform infrared spectra analysis for post-etched ultra-low- κ SiOCH dielectric using chemometric methods by Oszinda, Thomas, Beyer, Volkhard, Schaller, Matthias, Fischer, Daniel, Bartsch, Christin, Schulz, Stefan E.

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  6. 6
    CH-overtone regions as diagnostic markers for near-infrared spectroscopic diagnosis of primary cancers in human pancreas and colorectal tissue

    CH-overtone regions as diagnostic markers for near-infrared spectroscopic diagnosis of primary cancers in human pancreas and colorectal tissue by Kondepati, Venkata Radhakrishna, Oszinda, Thomas, Heise, H Michael, Luig, Klaus, Mueller, Ralf, Schroeder, Olaf, Keese, Michael, Backhaus, Juergen

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  7. 7
    How to evaluate surface free energies of dense and ultra low-[kappa] dielectrics in pattern structures

    How to evaluate surface free energies of dense and ultra low-[kappa] dielectrics in pattern structures by Oszinda, Thomas, Schaller, Matthias, Dittmar, Kornelia, Le Jiang, Le Jiang, Schulz, Stefan E

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  8. 8
    Detection of structural disorders in colorectal cancer DNA with Fourier-transform infrared spectroscopy

    Detection of structural disorders in colorectal cancer DNA with Fourier-transform infrared spectroscopy by Kondepati, Venkata Radhakrishna, Heise, H. Michael, Oszinda, Thomas, Mueller, Ralf, Keese, Michael, Backhaus, Juergen

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  9. 9
    How to Evaluate Surface Free Energies of Dense and Ultra Low-κ Dielectrics in Pattern Structures

    How to Evaluate Surface Free Energies of Dense and Ultra Low-κ Dielectrics in Pattern Structures by Oszinda, Thomas, Schaller, Matthias, Dittmar, Kornelia, Jiang, Le, Schulz, Stefan E.

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  10. 10
    How to evaluate surface free energies of dense and ultra low-k dielectrics in pattern structures

    How to evaluate surface free energies of dense and ultra low-k dielectrics in pattern structures by OSZINDA, Thomas, SCHALLER, Matthias, DITTMA, Kornelia, LE JIANG, SCHULZ, Stefan E

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  11. 11
    Investigation of physical and chemical property changes of ultra low-K SiOCH in aspect of cleaning and chemical repair processes

    Investigation of physical and chemical property changes of ultra low-K SiOCH in aspect of cleaning and chemical repair processes by OSZINDA, Thomas, SCHALLER, Matthias, FISCHER, Daniel, WALSH, Christine, SCHULZ, Stefan E

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  12. 12
    Characterization of plasma damaged porous ULK SiCOH layers in aspect of changes in the diffusion behavior of solvents and repair-chemicals

    Characterization of plasma damaged porous ULK SiCOH layers in aspect of changes in the diffusion behavior of solvents and repair-chemicals by Oszinda, T., Schaller, M., Fischer, D., Schulz, S.E.

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  13. 13
    Electrical property improvements of ultra low-k ILD using a silylation process feasible for process integration

    Electrical property improvements of ultra low-k ILD using a silylation process feasible for process integration by Thomas, O., Schaller, M., Gerlich, L., Fischer, D., Leppack, S., Bartsch, C., Schulz, S. E.

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