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Search Results - Ovental, Jennifer S
Search Results - Ovental, Jennifer S
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Corrosion Protection of Copper Using Al2O3, TiO2, ZnO, HfO2, and ZrO2 Atomic Layer Deposition
by
Daubert, James S
,
Hill, Grant T
,
Gotsch, Hannah N
,
Gremaud, Antoine P
,
Ovental, Jennifer S
,
Williams, Philip S
,
Oldham, Christopher J
,
Parsons, Gregory N
Published in
ACS applied materials & interfaces
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Intrinsic limitations of atomic layer deposition for pseudocapacitive metal oxides in porous electrochemical capacitor electrodes
by
Daubert, James S
,
Wang, Ruocun
,
Ovental, Jennifer S
,
Barton, Heather F
,
Rajagopalan, Ramakrishnan
,
Augustyn, Veronica
,
Parsons, Gregory N
Published in
Journal of materials chemistry. A, Materials for energy and sustainability
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Corrosion Protection of Copper Using Al 2 O 3 , TiO 2 , ZnO, HfO 2 , and ZrO 2 Atomic Layer Deposition
by
Daubert, James S
,
Hill, Grant T
,
Gotsch, Hannah N
,
Gremaud, Antoine P
,
Ovental, Jennifer S
,
Williams, Philip S
,
Oldham, Christopher J
,
Parsons, Gregory N
Published in
ACS applied materials & interfaces
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Modeling and experimental demonstration of high-throughput flow-through spatial atomic layer deposition of Al2O3 coatings on textiles at atmospheric pressure
by
Mousa, Moataz Bellah M.
,
Ovental, Jennifer S.
,
Brozena, Alexandra H.
,
Oldham, Christopher J.
,
Parsons, Gregory N.
Published in
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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TSV-Last Integration to Replace ASIC Wire Bonds in the Assembly of X-Ray Detector Arrays
by
Hicks, Jennifer Ovental
,
Malta, Dean
,
Bordelon, David
,
Richter, Daniel
,
Hong, Jaesub
,
Grindlay, Jonathan
,
Allen, Branden
,
Violette, Daniel P.
,
Miyasaka, Hiromasa
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Proof of Concept for Through Silicon Vias (TSVs) in Application Specific Integrated Circuits (ASICs) for Hard X-ray Imaging Detectors
by
Hong, Jaesub
,
Grindlay, Jonathan
,
Allen, Branden
,
Violette, Daniel P
,
Miyasaka, Hiromasa
,
Malta, Dean
,
Ovental, Jennifer
,
Bordelon, David
,
Richter, Daniel
Published in
arXiv.org
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