Search Results - Owe-Yang, DC

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  1. 1
    Thermal Flow Property for 193nm Photoresist with Low Dispersion Polymer

    Thermal Flow Property for 193nm Photoresist with Low Dispersion Polymer by Lee, Tin-Yu, Yu, Chao-Ying, Hsui, Meei-Yu, Hayashi, R., Hirayama, T., Iwai, T., Komano, H., Shih, JC, Owe-Yang, DC, Ho, Bang-Ching

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  2. 2
    A Si Device Making Method by Using PAG Contained TARC to Enhance DOF of Lithography Process

    A Si Device Making Method by Using PAG Contained TARC to Enhance DOF of Lithography Process by Shih, Jen-Chieh, Cheng, Jiang-Hong, Owe-Yang, Dah-Chung, Chang, Ching-Yu

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    Reflow Process for Contact Hole ArF Lithography

    Reflow Process for Contact Hole ArF Lithography by Ho, Rang-Ching, Owe-Yang, D. C., Lin, Shang-Ho, Chen, Harrison, Shih, J. C., Hsu, Chia-Sui, Chen, J. H.

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