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Monte Carlo simulation of arsenic ion implantation in (100) single-crystal silicon
by
Shyh-Horng Yang
,
Morris, S.J.
,
Shiyang Tian
,
Parab, K.B.
,
Tasch, A.F.
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IEEE transactions on semiconductor manufacturing
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Base and collector leakage currents and their relevance to the reliability of AlGaAs/GaAs heterojunction bipolar transistors
by
Liou, J.J.
,
Parab, K.B.
,
Huang, C.I.
,
Bayraktaroglu, B.
,
Williamson, D.C.
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Detailed analysis and computationally efficient modeling of ultra-shallow as-implanted profiles obtained by low energy B, BF/sub 2/, and As ion implantation
by
Parab, K.B.
,
Morris, M.F.
,
Yang, S.-H.
,
Morris, S.J.
,
Tian, S.
,
Obradovic, B.
,
Tasch, A.F.
,
Kamenitsa, D.
,
Simonton, R.
,
Magee, C.
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Ieee Transactions On Semiconductor Manufacturing
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Implants
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Ion Implantation
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