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Nested interconnect macro electrical yield improvement for advanced triple patterning integration
by
Silvestre, Mary Claire
,
He, Ming
,
Mahalingam, Anbu Selvam K M
,
Child, Craig
,
Roux, Alycia
,
Low, Chun Hui
,
Fisher, Daniel
,
Zhou, Yue
,
Park, DeNeil
,
Karakoy, Mert
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Etch Iso-Dense Cd Bias
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Nested Serpentine Structures
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Triple Patterning
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