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    Investigation of silicon nitride for spacer via plasma-enhanced atomic layer deposition using a (tert-butylamino)dimethylsilane precursor

    Investigation of silicon nitride for spacer via plasma-enhanced atomic layer deposition using a (tert-butylamino)dimethylsilane precursor by Park, Chae-Yeon, Lin Yang, Hae, Kim, Hye-Mi, Kim, Daejung, Park, Yongjoo, Park, Jongruyl, Shin, Seokhee, Park, Jin-Seong

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