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A new era for high-current, low-energy ion implantation
by
Parrill, Thomas M
,
Ameen, Michael S
,
Graf, Michael
,
Mazzola, Richard
Published in
Solid state technology
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Characterization of the α-Sn/CdTe(110) interface by angle-resolved X-ray photoemission
by
Lin, Tzer-Shen
,
Partin, William J.
,
Damminga, Gregg M.
,
Parrill, Thomas M.
,
Lee, Won-Jong
,
Chung, Yip-Wah
Published in
Surface science
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Predictive process simulation of cryogenic implants for leading edge transistor design
by
Gossmann, Hans-Joachim
,
Zographos, Nikolas
,
Park, Hugh
,
Colombeau, Benjamin
,
Parrill, Thomas
,
Khasgiwale, Niranjan
,
Borges, Ricardo
,
Gull, Ronald
,
Erokhin, Yuri
,
Synopsys Switzerland LLC, Thurgauerstrasse 40, 8050 Zuerich
,
Applied Materials, Inc., Varian Semiconductor Equipment Business Unit, 35 Dory Road, Gloucester, MA 01930
,
Synopsys Inc., 1101 Slater Road, Durham, NC 27703
,
Applied Materials, Inc., Varian Semiconductor Equipment Business Unit, 35 Dory Road, Gloucester, MA 01930
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