EUV discharge light source based on a dense plasma focus operated with positive and negative polarity by Fomenkov, I V, Böwering, N, Rettig, C L, Melnychuk, S T, Oliver, I R, Hoffman, J R, Khodykin, O V, Ness, R M, Partlo, W N

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Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations by Böwering, N., Martins, M., Partlo, W. N., Fomenkov, I. V.

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Diffuser speckle model: application to multiple moving diffusers by Partlo, W N, Oldham, W G

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Performance characterization for an excimer laser solid-state pulsed power module (SSPPM) after 20B shots by Ness, R., Melcher, P.C., Smith, B., Partlo, W.N., Birx, D.

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213nm lithography by Hutchinson, J.M., Partlo, W.N., Hsu, R., Oldman, W.G.

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Quartz inhomogeneity effects in diffraction-limited deep ultraviolet imaging by Pfau, A K, Partlo, W N, Hsu, R, Oldham, W G

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Transmission measurements of pellicles for deep-UV lithography by Partlo, W.N., Oldham, W.G.

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EUV discharge light source based on a dense plasma focus operated with positive and negative polarity : Special cluster on extreme ultraviolet light sources for semiconductor manuf... by FOMENKOV, I. V, BOWERING, N, RETTIG, C. L, MELNYCHUK, S. T, OLIVER, I. R, HOFFMAN, J. R, KHODYKIN, O. V, NESS, R. M, PARTLO, W. N

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Solid-state pulsed power module (SSPPM) design for a dense plasma focus (DPF) device for semiconductor lithography applications by Ness, R.M., Partlo, W.N.

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0.25μm lithography using a deep-UV stepper with annular illumination by Yen, A., Partlo, W.N., McCleary, R.W., Tipton, M.C.

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EUV laser produced plasma source development by Farrar, Nigel R., Brandt, David C., Fomenkov, Igor V., Ershov, Alex I., Bowering, Norbert R., Partlo, William N., Myers, David W., Bykanov, Alexander N., Vaschenko, Georgiy O., Khodykin, Oleh V., Hoffman, Jerzy R., Chrobak, Christopher P.

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