Search Results - Peignon, Marie-Claude

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  1. 1
    Plasma etching: principles, mechanisms, application to micro- and nano-technologies

    Plasma etching: principles, mechanisms, application to micro- and nano-technologies by Cardinaud, Christophe, Peignon, Marie-Claude, Tessier, Pierre-Yves

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  2. 2
    Modelling of fluorine based high density plasma for the etching of silica glasses

    Modelling of fluorine based high density plasma for the etching of silica glasses by Lallement, Ludovic, Rhallabi, Ahmed, Cardinaud, Christophe, Peignon Fernandez, Marie Claude

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  3. 3
    Roughness and chemistry of silicon and polysilicon surfaces etched in high-density plasma: XPS, AFM and ellipsometry analysis

    Roughness and chemistry of silicon and polysilicon surfaces etched in high-density plasma: XPS, AFM and ellipsometry analysis by Rolland, Laëtitia, Vallée, Christophe, Peignon, Marie-Claude, Cardinaud, Christophe

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  4. 4
    Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2

    Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2 by Gaboriau, Freddy, Peignon, Marie-Claude, Cartry, Gilles, Rolland, Laetitia, Eon, David, Cardinaud, Christophe, Turban, Guy

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  5. 5
    Measurements of rf bias effect in a dual electron cyclotron resonance-rf methane plasma using the Langmuir probe method

    Measurements of rf bias effect in a dual electron cyclotron resonance-rf methane plasma using the Langmuir probe method by Hong, Junegie, Granier, Agnès, Leteinturier, Christiane, Peignon, Marie-Claude, Turban, Guy

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  6. 6
    Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO 2

    Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO 2 by Gaboriau, Freddy, Peignon, Marie-Claude, Cartry, Gilles, Rolland, Laetitia, Eon, David, Cardinaud, Christophe, Turban, Guy

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  7. 7
    Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO sub(2)

    Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO sub(2) by Gaboriau, Freddy, Peignon, Marie-Claude, Cartry, Gilles, Rolland, Laetitia, Eon, David, Cardinaud, Christophe, Turban, Guy

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