Scatterometry measurement for SiGe AEI sigma-shaped gate structures of 28nm technology by Yu-Wen Wang, Yeh, A., Pao-Chung Lin, Chin-Cheng Chien, Lin, C-H B., Xu, Z-Q J., Cheng, C-Y H., Sungchul Yoo, Lin, J., Mihardja, L., Perry-Sullivan, C.

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Control Strategy for Wafer-Edge Defects by Hsu, M F, Yang, J H, Yang, E, Chen, H, M. Ng, M. Li, Perry-Sullivan, C

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