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    Influence of [Cr.sup.+] ion implantation and pulsed ion-beam annealing on the formation and optical properties of Si/Cr[Si.sub.2]/Si heterostructures

    Influence of [Cr.sup.+] ion implantation and pulsed ion-beam annealing on the formation and optical properties of Si/Cr[Si.sub.2]/Si heterostructures by Galkin, N.G, Goroshko, D.L, Galkin, K.N, Vavanova, S.V, Petrushkin, I.A, Maslov, A.M, Batalov, R.I, Bayazitov, R.M, Shustov, V.A

    Published in Technical physics
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