Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers by Phae-ngam, W., Horprathum, M., Chananonnawathorn, C., Lertvanithphol, T., Samransuksamer, B., Songsiriritthigul, P., Nakajima, H., Chaiyakun, S.

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Laser applications in arts and culture: An example on the construction of tiered umbrellas by Phae-ngam, W., Tapanwong, V., Jeraratcharatthorn, K., Sriwaralak, P., Chaiyakun, T., Kamoldilok, S., Kosalathip, V., Naemchanthara, K., Limsuwan, P.

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Deposition of alternative plasmonic ZrHfN thin films via closed-field dual-cathode DC unbalanced magnetron sputtering for enhanced SEF substrate applications by Chaikeeree, T., Kasayapanand, N., Mungkung, N., Phae-ngam, W., Lertvanithphol, T., Dhanasiwawong, K., Nakajima, H., Gitgeatpong, G., Prathumsit, J., Chittinan, D., Arunrungrusmi, S., Triamnak, N., Horprathum, M.

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The effect of thickness on the properties of Zr-Hf-N thin films prepared by reactive co-magnetron sputtering by Prathumsit, J., Gitgeatpong, G., Phae-ngam, W., Chananonnawathorn, C., Lertvanithphol, T., Horprathum, M.

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Formation of HfOxNy nanorod GLAD films growth by rapid thermal oxidation by Phae-ngam, W., Prathumsit, J., Chananonnawathorn, C., Nakajima, H., Lertvanithphol, T., Pogfay, T., Limsuwan, N., Phokharatkul, D., Vora-ud, A., Triamnak, N., Mungchamnankit, A., Horprathum, M., Limsuwan, P.

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Effect of post annealed treatment on HfN thin films prepared by DC reactive magnetron sputtering by Phae-ngam, W., Prathumsit, J., Gitgeatpong, G., Chananonnawathorn, C., Lertvanithphol, T., Saekow, B., Nakajima, H., Horprathum, M.

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