Virtual Metrology applied in Run-to-Run Control for a Chemical Mechanical Planarization process by Jebri, M.A., El Adel, E.M., Graton, G., Ouladsine, M., Pinaton, J.

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Virtual metrology based on relevant feature extraction and just-in-time learning approach by Jebri, M. A., Graton, G., Adel, E. M. El, Ouladsine, M., Pinaton, J.

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Implementation of MIMO R2R control regulation on furnaces processes by Richard, B, Roussy, A, Brun, L, Pompier, D, Alegret, C, Pinaton, J

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The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization process by Jebri, M.A., El Adel, E.M., Graton, G., Ouladsine, M., Pinaton, J.

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Embedded spectroscopic reflectometry metrology on FEOL silicon dioxide trench polishing equipment: ER: Equipement reliability and productivity enhancements by Bourzgui, S., Roussy, A., Blue, J., Georges, G., Faivre, E., Labory, K., Pinaton, J.

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Virtual metrology on Chemical Mechanical Planarization process based on Just-In-Time Learning by Jebri, M. A., Graton, G., El Adel, E. M., Ouladsine, M., Pinaton, J.

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Efficient FDC based on hierarchical tool condition monitoring scheme by Blue, J., Roussy, A., Thieullen, A., Pinaton, J.

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Oxide HDP-CVD Modeling for Shallow Trench Isolation by Roussy, A, Delachet, L, Belharet, D, Pinaton, J, Collot, P

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Impact of control plan design on tool risk management: A simulation study in semiconductor manufacturing by Verjan, G. L. R., Dauzere-Peres, S., Pinaton, J.

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Wet etch step modelling to help shallow trench isolation module control by Roussy, A., Gedion, M., Crousier, N., Pinaton, J., Labory, K.

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A mathematical model for estimating defect inspection capacity with a dynamic control strategy by Rodriguez-Verjan, G. L., Dauzere-Peres, S., Pinaton, J.

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A Smart Sampling Scheduling and Skipping Simulator and its evaluation on real data sets by Yugma, C., Dauzere-Peres, S., Rouveyrol, J., Vialletelle, P., Pinaton, J., Relliaud, C.

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The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization processThis work is part of the European projects "INTEGRATE" and "MAGE", and ca... by Jebri, M.A., El Adel, E.M., Graton, G., Ouladsine, M., Pinaton, J.

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The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization process This work is part of the European projects "INTEGRATE" and "MAGE", and c... by Jebri, M., El Adel, M., Graton, G., Ouladsine, M., Pinaton, J.

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Feed-forward run-to-run control for reduced parametric transistor variation in CMOS logic 0.13μm technology by Jedidi, N., Sallagoity, P., Roussy, A., Dauzere-Peres, S., Pinaton, J.

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Virtual metrology on semiconductor manufacturing based on Just-in-time learningThis work is a part of the European project ”INTEGRATE”, and carried by STMicroelectronics Fab by Jebri, M.A., El Adel, E.M., Graton, G., Ouladsine, M., Pinaton, J.

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New methodology for modeling large scale manufacturing process: Using process mining methods and experts' knowledge by Viale, P., Frydman, C., Pinaton, J.

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A survey of semantic web standards to representing knowledge in problem solving situations by Bouzid, S., Cauvet, C., Pinaton, J.

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Dispatching of lots to dynamically reduce the wafers at risk in semiconductor manufacturing by Rodriguez-Verjan, G., Tartiere, E., Pinaton, J., Dauzere-Peres, S., Thieullen, A.

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Translation-Invariant Multiscale Energy-Based PCA for Monitoring Batch Processes in Semiconductor Manufacturing by Rato, Tiago J., Blue, Jakey, Pinaton, Jacques, Reis, Marco S.

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