Numerical simulation of mass transfer for bubbles in water by Ponoth, Shom S., McLaughlin, J.B.

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Fabrication of micromirrors with self-aligned metallization using silicon back-end-of-the-line processes by Ponoth, Shom S., Agarwal, Navnit T., Persans, Peter D., Plawsky, Joel L.

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Plasma silicon oxide–silica xerogel based planar optical waveguides by Ponoth, Shom S., Agarwal, Navnit T., Persans, Peter D., Plawsky, Joel L.

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Fabrication of controlled sidewall angles in thin films using isotropic etches by Ponoth, Shom S., Agarwal, Navnit T., Persans, Peter D., Plawsky, Joel L.

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Scalability of Extremely Thin SOI (ETSOI) MOSFETs to Sub-20-nm Gate Length by Khakifirooz, A., Kangguo Cheng, Reznicek, A., Adam, T., Loubet, N., Hong He, Kuss, J., Juntao Li, Kulkarni, P., Ponoth, S., Sreenivasan, R., Qing Liu, Doris, B., Shahidi, G.

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Processing dependent thermal conductivity of nanoporous silica xerogel films by Jain, Anurag, Rogojevic, Svetlana, Ponoth, Shom, Gill, William N., Plawsky, Joel L., Simonyi, Eva, Chen, Shyng-Tsong, Ho, P. S.

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Optimized oxygen plasma etching of polyimide films for low loss optical waveguides by Agarwal, Navnit, Ponoth, Shom, Plawsky, Joel, Persans, P. D.

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Roughness evolution in polyimide films during plasma etching by Agarwal, Navnit, Ponoth, Shom, Plawsky, Joel, Persans, P. D.

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Fully-depleted planar technologies and static RAM by Hook, T., Cheng, K., Doris, B., Khakifirooz, Ali, Qing Liu, Ponoth, Shom, Radens, Carl, Vinet, Maud

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Ultra-Thin Body and BOX (UTBB) Device for Aggressive Scaling of CMOS Technology by Liu, Qing, Yagishita, Atsushi, Kumar, Arvind, Loubet, Nicolas, Yamamoto, Toyoji, Kulkarni, Pranita, Monsieur, Frederic, Khakifirooz, Ali, Ponoth, Shom, Cheng, Kangguo, Haran, Bala, Vinet, Maud, Cai, Jin, Khare, Prasanna, Monfray, Stephane, Boeuf, Frederic, Mehta, Sanjay, Kuss, James, Leobandung, Effendi, Hane, Masami, Bu, Huiming, Ishimaru, Kazunari, Skotnicki, Thomas, Kleemeier, Walter, Takayanagi, Mariko, Hook, Terence, Khare, Mukesh, Luning, Scott, Doris, Bruce, Sampson, Ron

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Building a Domain-specific Guardrail Model in Production by Niknazar, Mohammad, Haley, Paul V, Ramanan, Latha, Truong, Sang T, Shrinivasan, Yedendra, Bhowmick, Ayan Kumar, Dey, Prasenjit, Jagmohan, Ashish, Maheshwari, Hema, Ponoth, Shom, Smith, Robert, Vempaty, Aditya, Haber, Nick, Koyejo, Sanmi, Sundararajan, Sharad

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Transistor matching and silicon thickness variation in ETSOI technology by Hook, T. B., Vinet, M., Murphy, R., Ponoth, S., Grenouillet, L.

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Fully-depleted planar technologies and static RAM by Hook, T., Cheng, K., Doris, B., Khakifirooz, Ali, Qing Liu, Ponoth, Shom, Radens, Carl, Vinet, Maud

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Energy transport in plasma etching of nanoporous dielectric materials by Plawsky, Joel, Ponoth, Shom, Dalakos, George, Malek, Kourosh, Coppens, Marc-Olivier

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Optical waveguides with embedded air-gap cladding integrated within a sea-of-leads (SoL) wafer-level package by Mule, A., Bakir, M., Jayachandran, J., Villalaz, R., Reed, H., Agrawal, N., Shom Ponoth, Plawsky, J., Persans, P., Kohl, P., Martin, K., Glytsis, E., Gaylord, T., Meindl, J.

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