Search Results - Pourmousavi, Leila

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  1. 1
    A Novel Hybrid Hand Instrumentation Technique for Root Canal Preparation

    A Novel Hybrid Hand Instrumentation Technique for Root Canal Preparation by Bolourchi, Iman, Pourmousavi, Leila

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  2. 2
    Efficacy of the Orifice-Level Passive Ultrasonic Activation Technique in Removing Debris from Mandibular Molars: An Ex Vivo Study

    Efficacy of the Orifice-Level Passive Ultrasonic Activation Technique in Removing Debris from Mandibular Molars: An Ex Vivo Study by Bolourchi, Iman, Zargar, Nazanin, Khosravi, Kamyar, Mashhadiabbas, Fatemeh, Akbarzadeh Baghban, Alireza, Pourmousavi, Leila

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  3. 3
    Direct Sulfonylation of Aromatic Rings with Aryl or Alkyl Sulfonic Acid Using Supported P2O5/Al2O3

    Direct Sulfonylation of Aromatic Rings with Aryl or Alkyl Sulfonic Acid Using Supported P2O5/Al2O3 by Hajipour, Abdol. R., Zarei, Amin, Khazdooz, Leila, Pourmousavi, Seied A., Mirjalili, Bi Bi F., Ruoho, A. E.

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  4. 4
    Silica sulfuric acid as a mild and chemoselective catalyst for dithioacetalization under solvent-free conditions

    Silica sulfuric acid as a mild and chemoselective catalyst for dithioacetalization under solvent-free conditions by Hajipour, Abdol R., Zarei, Amin, Khazdooz, Leila, Pourmousavi, Seied A., Zahmatkesh, Saeed, Ruoho, Arnold E.

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  5. 5
    Direct Sulfonylation of Aromatic Rings with Aryl or Alkyl Sulfonic Acid Using Supported P 2 O 5 /Al 2 O 3

    Direct Sulfonylation of Aromatic Rings with Aryl or Alkyl Sulfonic Acid Using Supported P 2 O 5 /Al 2 O 3 by Hajipour, Abdol. R., Zarei, Amin, Khazdooz, Leila, Pourmousavi, Seied A., Mirjalili, Bi Bi F., Ruoho, A. E.

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  6. 6
    Silicasulfuric Acid/NaNO2 as a New Reagent for Deprotection of S,S-Acetals under Solvent-free Conditions

    Silicasulfuric Acid/NaNO2 as a New Reagent for Deprotection of S,S-Acetals under Solvent-free Conditions by Abdol R. Hajipour, Amin Zarei, Leila Khazdooz, Seied Ali Pourmousavi, Arnold E. Ruoho

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  7. 7
    Silicasulfuric Acid/NaNO 2 as a New Reagent for Deprotection of S,S-Acetals under Solvent-free Conditions

    Silicasulfuric Acid/NaNO 2 as a New Reagent for Deprotection of S,S-Acetals under Solvent-free Conditions by Hajipour, Abdol R, Zarei, Amin, Khazdooz, Leila, Pourmousavi, Seied Ali, Ruoho, Arnold E

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