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Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties
by
Bobzin, Kirsten
,
Bagcivan, Nazlim
,
Theiß, Sebastian
,
Trieschmann, Jan
,
Brugnara, Ricardo Henrique
,
Preissing, Sven
,
Hecimovic, Ante
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Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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Journal Of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films
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Argon
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Atoms
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Coatings
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Comparative Evaluations
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Condensed Matter Physics, Superconductivity And Superfluidity
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Hardness
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Ions
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Krypton
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Length
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Magnetrons
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Materials Science
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Materials Science, Coatings & Films
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Physical Sciences
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Physical Vapor Deposition
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Physics
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Physics, Applied
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Plasma
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Pulses
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Science & Technology
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Sputtering
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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American Institute Of Physics (Aip) Publications
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