Search Results - Preuninger, Fred

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  1. 1
    Detection and comparison of localized states produced in poly-Si/ultra-thin oxide/silicon, structures by plasma exposure or plasma charging during reactive ion etching

    Detection and comparison of localized states produced in poly-Si/ultra-thin oxide/silicon, structures by plasma exposure or plasma charging during reactive ion etching by Fonash, Stephen J., Ozaita, Milagros, Awadelkarim, Osama O., Preuninger, Fred, Chan, Y. D.

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  2. 2
    Cyclic current-voltage characterization applied to edge damage evaluation in gate definition plasma etching

    Cyclic current-voltage characterization applied to edge damage evaluation in gate definition plasma etching by Okandan, M., Fonash, S.J., Ozaita, M., Preuninger, F., Chan, Y.D., Werking, J.

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    Soft-breakdown damage in MOSFET's due to high-density plasma etching exposure

    Soft-breakdown damage in MOSFET's due to high-density plasma etching exposure by Okandan, M., Fonash, S.J., Awadelkarim, O.O., Chan, Y.D., Preuninger, F.

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