Search Results - Profijt, Harald

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  1. 1
    Radical recombination sensor based on dual probe thermopile heat flux sensors

    Radical recombination sensor based on dual probe thermopile heat flux sensors by Velthuis, Johannes F. M., Storm, Arnold, van Kampen, Maarten, van der Horst, Ruud, Profijt, Harald B.

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  2. 2
    Fundamentals of Ge1−xSnx and SiyGe1−x-ySnx RPCVD epitaxy

    Fundamentals of Ge1−xSnx and SiyGe1−x-ySnx RPCVD epitaxy by Margetis, Joe, Mosleh, Aboozar, Ghetmiri, Seyed Amir, Al-Kabi, Sattar, Dou, Wei, Du, Wei, Bhargava, Nupur, Yu, Shui-Qing, Profijt, Harald, Kohen, David, Loo, Roger, Vohra, Anurag, Tolle, John

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  3. 3
    (Invited) Selective Epitaxial Growth of High-P Si:P for Source/Drain Formation in Advanced Si nFETs

    (Invited) Selective Epitaxial Growth of High-P Si:P for Source/Drain Formation in Advanced Si nFETs by Rosseel, Erik, Dhayalan, Sathish Kumar, Hikavyy, Andriy Yakovitch, Loo, Roger, Profijt, Harald Benjamin, Kohen, David, Kubicek, Stefan, Chiarella, Thomas, Yu, Hao, Horiguchi, Naoto, Mocuta, Dan, Barla, Kathy, Thean, Aaron, Bartlett, Gregory, Margetis, Joe, Bhargava, Nupur, Tolle, John

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  4. 4
    Characterization of Epitaxial Si:C:P and Si:P Layers for Source/Drain Formation in Advanced Bulk FinFETs

    Characterization of Epitaxial Si:C:P and Si:P Layers for Source/Drain Formation in Advanced Bulk FinFETs by Rosseel, Erik, Profijt, Harald Benjamin, Hikavyy, Andriy Yakovitch, Tolle, John, Kubicek, Stefan, Mannaert, Geert, L'abbe, Caroline, Wostyn, Kurt, Horiguchi, Naoto, Clarysse, Trudo, Parmentier, Brigitte, Dhayalan, Sathishkumar, Bender, Hugo, Maes, Jan Willem, Mehta, Sandeep, Loo, Roger

    Published in ECS transactions
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  5. 5
    Ion Bombardment during Plasma-Assisted Atomic Layer Deposition

    Ion Bombardment during Plasma-Assisted Atomic Layer Deposition by Profijt, Harald Benjamin, Kessels, W.M.M.

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  6. 6
    Stable diamagnetic self-levitation of a micro-magnet by improvement of its magnetic gradients

    Stable diamagnetic self-levitation of a micro-magnet by improvement of its magnetic gradients by Profijt, H.B., Pigot, C., Reyne, G., Grechishkin, R.M., Cugat, O.

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  7. 7
    Fundamentals of Ge 1−x Sn x and Si y Ge 1−x-y Sn x RPCVD epitaxy

    Fundamentals of Ge 1−x Sn x and Si y Ge 1−x-y Sn x RPCVD epitaxy by Margetis, Joe, Mosleh, Aboozar, Ghetmiri, Seyed Amir, Al-Kabi, Sattar, Dou, Wei, Du, Wei, Bhargava, Nupur, Yu, Shui-Qing, Profijt, Harald, Kohen, David, Loo, Roger, Vohra, Anurag, Tolle, John

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  8. 8
    Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

    Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD by Potts, Stephen Ernest, Profijt, Harald Benjamin, Roelofs, Robin, Kessels, W.M.M.

    Published in ECS transactions
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  9. 9
    The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides

    The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides by Profijt, Harald B., Kudlacek, Pavel, Van de Sanden, M. C. M., Kessels, W. M. M.

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