Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy by KLEINEBERG, U, HAINDL, G, HÜTTEN, A, REISS, G, GULLIKSON, E. M, JONES, M. S, MROWKA, S, REKAWA, S. B, UNDERWOOD, J. H

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Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture by Goldberg, K. A., Naulleau, P., Mochi, I., Anderson, E. H., Rekawa, S. B., Kemp, C. D., Gunion, R. F., Han, H.-S., Huh, S.

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Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture by Goldberg, K. A., Naulleau, P., Mochi, I., Anderson, E. H., Rekawa, S. B., Kemp, C. D., Gunion, R. F., Han, H.-S., Huh, S.

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At-wavelength alignment and testing of the 0.3 NA MET optic by Goldberg, Kenneth A., Naulleau, Patrick P., Denham, Paul E., Rekawa, Senajith B., Jackson, Keith, Anderson, Erik H., Liddle, J. Alexander

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Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic by Goldberg, Kenneth A., Naulleau, Patrick P., Denham, Paul E., Rekawa, Senajith B., Jackson, Keith H., Liddle, J. Alexander, Harteneck, Bruce, Gullikson, Eric, Anderson, Erik H.

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In situ fine tuning of bendable soft x-ray mirrors using a lateral shearing interferometer by Merthe, Daniel J., Goldberg, Kenneth A., Yashchuk, Valeriy V., McKinney, Wayne R., Celestre, Richard, Mochi, Iacopo, MacDougall, James, Morrison, Gregory Y., Rekawa, Senajith B., Anderson, Erik, Smith, Brian V., Domning, Edward E., Padmore, Howard

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Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays by Merthe, Daniel J, Yashchuk, Valeriy V, Goldberg, Kenneth A, Kunz, Martin, Tamura, Nobumichi, McKinney, Wayne R, Artemiev, Nikolay A, Celestre, Richard S, Morrison, Gregory Y, Anderson, Erik H, Smith, Brian V, Domning, Edward E, Rekawa, Senajith B, Padmore, Howard A

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Methodology for Optical in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays by Merthe, Daniel J, Vashchuk, Valeriy V, Goldberg, Kenneth A, Kunz, Martin, Tamura, Nobumichi, McKinney, Wayne R, Artemiev, Nikolay A, Celestre, Richard S, Morrison, Gregory Y, Anderson, Erik H, Smith, Brian V, Domning, Edward E, Rekawa, Senajith B, Padmore, Howard A

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A design study for synchrotron-based high-numerical-aperture scanning illuminators by Naulleau, Patrick P, Denham, Paul E, Hoef, Brian, Rekawa, Senajith

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Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic by Naulleau, Patrick, Goldberg, Kenneth A., Anderson, Erik H., Attwood, David, Batson, Phillip, Bokor, Jeffrey, Denham, Paul, Gullikson, Eric, Harteneck, Bruce, Hoef, Brian, Jackson, Keith, Olynick, Deirdre, Rekawa, Seno, Salmassi, Farhad, Blaedel, Ken, Chapman, Henry, Hale, Layton, Mirkarimi, Paul, Soufli, Regina, Spiller, Eberhard, Sweeney, Don, Taylor, John, Walton, Chris, O’Connell, Donna, Tichenor, Daniel, Gwyn, Charles W., Yan, Pei-Yang, Zhang, Guojing

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Euv system optimization and advanced lithography research at Lawrence Berkeley National Laboratory by Goldberg, K.A., Naulleau, P.P., Denham, P.E., Rekawa, S.B., Jackson, K.H., Anderson, E.H., Liddle, J.A.

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