Search Results - Ramanathan, Eswar

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  1. 1
    Enhanced Cu CMP Process Control by Machine Learning Enabled Measurement on E-Test Macro

    Enhanced Cu CMP Process Control by Machine Learning Enabled Measurement on E-Test Macro by Timoney, Padraig, Luke, Joseph, Rovereto, Mark, Wyble, Jordan, Lien, Cheng-Ting, Alamgir, Zahir, Ramanathan, Eswar

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  2. 2
    Defectivity and Yield Impact From the AMC Inside the FOUP in Advanced Technologies

    Defectivity and Yield Impact From the AMC Inside the FOUP in Advanced Technologies by Barker, John, Miner, Stephen, Wei Zhao, Jong Soo Kim, Moore, Joshua, Ramanathan, Eswar, Case, Sara, Waite, Stephanie

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  3. 3
    Bevel rinse optimization for reduced edge defectivity and improved edge yield

    Bevel rinse optimization for reduced edge defectivity and improved edge yield by Silvestre, Mary Claire, Ramanathan, Eswar, Hildreth, Scott, Duggan, Mark, Riendeau, Jeffrey, Dumas, Laurent

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  4. 4
    Impact of FOUP environment on product yield in advanced technologies

    Impact of FOUP environment on product yield in advanced technologies by Case, Sara, Waite, Stephanie, Barker, John, Wei Zhao, Jong Soo Kim, Moore, Joshua, Ramanathan, Eswar

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  5. 5
    Study of Probe Contact Resistance Impact on Inline Testing with Different Bond Pad Design in BEOL

    Study of Probe Contact Resistance Impact on Inline Testing with Different Bond Pad Design in BEOL by Ramanathan, Eswar, Katragadda, Veenadhar, Gasasira, Arthur, Muthee, Martin, Riendeau, Jeffrey, Hatzistergos, Michael, Mody, Jay, Teo, Kok Hin, Clements, Justin, Qiu, Jian, Wang, Qiushi, Nicolai, Petrov, Liao, Vincent, Hwang, Jung Tae, Krom, Raymond, Venkatasubramanian, Vandana, Bombardier, Colin, Ahmed, Shafaat, Montgomery, Christa, Brown, Owen, Smith, Lloyd, Cusick, Alan, Soler, Edwin, Evans, Bill

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  6. 6
    Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology

    Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology by Ramanathan, Eswar, Johanson, Henrik, Damjanovic, Daniel, Sun, ZhiGuo, Sircar, Anirvan, Eah, Sang-Kee, Bombardier, Colin, DaSilva, Adam, O'Brien, Brendan, Roux, Alycia, Cucci, Brett, Jiang, Lei, Christopher, Ordonio, Montgomery, Christa, Venkatasubramanian, Vandana, Rana, Vijaya, Mody, Jay, Shepard, Joseph, Child, Craig, Morganfeld, Bradley, Sheraw, Rebekah, Takmeel, Qanit, MaryClaire, Silvestre, Mahalingam, AnbuSelvam K.M., Ghosh, Somnath, Donegan, Keith, Chandrasekar, Ashwini, Singh, Sunil

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  7. 7
    Hammer test to detect BEOL process marginalities on via chains in advanced nodes

    Hammer test to detect BEOL process marginalities on via chains in advanced nodes by Mahalingam, Anbu Selvam Km, Silvestre, Mary Claire, Ramanathan, Eswar, Ordonio, Christopher, Schaller, John

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  8. 8
    Trench first metal hardmask post-lithography novel rework process for defectivity and yield improvement

    Trench first metal hardmask post-lithography novel rework process for defectivity and yield improvement by Silvestre, Mary Claire, Gogna, Mukesh, Mahalingam, Anbu Selvam K. M., Ramanathan, Eswar, Ordonio, Christopher, Schaller, John

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  9. 9
    Optimizing Cu barrier thickness for interconnects performance, reliability and yield

    Optimizing Cu barrier thickness for interconnects performance, reliability and yield by Tian Shen, Rajagopalan, Balajee, Silvestre, Mary Claire, Ramanathan, Eswar, Mahalingam, Anbu Selvam K. M., Wenyi Zhang, Kong Boon Yeap, Justison, Patrick

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  10. 10
    Extra-pattern killer defectivity improvement and enhancement of within-feature barrier coverage by optimization of TaN barrier PVD process in 90p Cu wire interconnects for 28nm technology

    Extra-pattern killer defectivity improvement and enhancement of within-feature barrier coverage by optimization of TaN barrier PVD process in 90p Cu wire interconnects for 28nm tec... by Rajagopalan, Balajee, Laloe, Jean-Baptiste, Silvestre, Mary Claire, Ramanathan, Eswar, Khanal, Sohana, Laval, Alain, Ge, Qian, Takahashi, Nobuyuki, Mahalingam, Anbu Selvam, Liew, San Leong, Teagle, Robert

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  11. 11
    Effect of top corner rounding in BEOL to yield in advanced technologies

    Effect of top corner rounding in BEOL to yield in advanced technologies by Ramanathan, Eswar, Silvestre, Mary Claire, Mahalingam, Anbu Selvam Km, Garg, Niti, Siddhartha, Siddhartha, Ordonio, Christopher, Schaller, John

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  12. 12
    A study on the interaction between barrier and plating causing edge stringer defects in 28nm

    A study on the interaction between barrier and plating causing edge stringer defects in 28nm by Ramanathan, Eswar, Smith, Frank, Fiacco, Antonio, Silvestre, Mary Claire, Parks, Val, Rajagopalan, Balajee, Scott, Hildreth, Barker, John, Riendeau, Jeffrey, Laloe, Jean-Baptiste

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  13. 13
    Vertical natural capacitor time dependent dielectric breakdown (TDDB) improvement in 28nm

    Vertical natural capacitor time dependent dielectric breakdown (TDDB) improvement in 28nm by Silvestre, Mary Claire, Wenyi, Zhang Galor, Selvam, Km Mahalingam Anbu, Ramanathan, Eswar, Ordonio, Christopher, Schaller, John, Lee Jong Hyup, Capasso, Cristiano, Justison, Patrick

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  14. 14
    Design-enabled manufacturing enablement using manufacturing design request tracker (MDRT)

    Design-enabled manufacturing enablement using manufacturing design request tracker (MDRT) by Sultan, Akif, Desineni, Rao, Hassmann, Jens, Hoeppner, Kristina, Ramanathan, Eswar, Babcock, Carl, Chua, Kok Peng, Teoh, Edward, Dai, Vito, Yeo, Sky, Hui, Colin, Capodieci, Luigi, McGowan, Sarah, Madge, Robert

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  15. 15
    Optimization strategies for expression and purification of soluble N-terminal domain of human centriolar protein SAS-6 in Escherichia coli

    Optimization strategies for expression and purification of soluble N-terminal domain of human centriolar protein SAS-6 in Escherichia coli by Maddi, Eswar Reddy, Natesh, Ramanathan

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  16. 16
    Delayed unrelated presentation of a lumbar burst fracture consequent to a remote episode of a single convulsive seizure: A diagnostic challenge

    Delayed unrelated presentation of a lumbar burst fracture consequent to a remote episode of a single convulsive seizure: A diagnostic challenge by Bosco, Aju, Uvaraj, Nalli Ramanathan, Ramakrishnan, Eswar

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  17. 17
    Hypomorphic mutations in human DNA ligase IV lead to compromised DNA binding efficiency, hydrophobicity and thermal stability

    Hypomorphic mutations in human DNA ligase IV lead to compromised DNA binding efficiency, hydrophobicity and thermal stability by Maddi, Eswar Reddy, Raghavan, Sathees C, Natesh, Ramanathan

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  18. 18
    Experience with Administration of Ruxolitinib after Allogeneic Stem Cell Transplantation (alloSCT) in Patients with Myelofibrosis

    Experience with Administration of Ruxolitinib after Allogeneic Stem Cell Transplantation (alloSCT) in Patients with Myelofibrosis by Tipirneni, Eswar, MD, Kodali, Saranya, MD, Ramanathan, Muthalagu, MD, Nath, Rajneesh, MD, Cerny, Jan, MD, PhD, FACP

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  19. 19
    Allogeneic Stem Cell Transplant Improves the Outcome of Patients with Acute Erythroleukemia: Single Center Analysis

    Allogeneic Stem Cell Transplant Improves the Outcome of Patients with Acute Erythroleukemia: Single Center Analysis by Kodali, Saranya, MD, Tipirneni, Eswar, MD, Yu, Hongbo, MD, PhD, Zhou, Zheng, MD, PhD, Ramanathan, Muthalagu, MD, Nath, Rajneesh, MD, Cerny, Jan, MD, PhD, FACP

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  20. 20
    Delayed unrelated presentation of a lumbar burst fracture consequent to a remote episode of a single convulsive seizure: A diagnostic challenge

    Delayed unrelated presentation of a lumbar burst fracture consequent to a remote episode of a single convulsive seizure: A diagnostic challenge by Bosco, Aju, Uvaraj, Nalli Ramanathan, Ramakrishnan, Eswar

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