Influence of growth temperature on the structure and electrical properties of high-permittivity TiO2 films in TiCl4-H2O and TiCl4-O3 atomic-layer-deposition processes by Arroval, T., Aarik, L., Rammula, R., Mändar, H., Aarik, J., Hudec, B., Hušeková, K., Fröhlich, K.

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Structural characterization of TiO2-Cr2O3 nanolaminates grown by atomic layer deposition by SAMMELSELG, V, TARRE, A, LU, J, AARIK, J, NIILISLC, A, UUSTARE, T, NETSIPAILO, I, RAMMULA, R, PÄRNA, R, ROSENTAL, A

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Influence of growth temperature on the structure and electrical properties of high‐permittivity Ti O 2 films in Ti C l 4 ‐ H 2 O and Ti C l 4 ‐ O 3 atomic‐layer‐deposition processe... by Arroval, T., Aarik, L., Rammula, R., Mändar, H., Aarik, J., Hudec, B., Hušeková, K., Fröhlich, K.

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Influence of growth temperature on the structure and electrical properties of high-permittivity TiO sub(2) films in TiCl sub(4)-H sub(2)O and TiCl sub(4)-O sub(3) atomic-layer-depo... by Arroval, T, Aarik, L, Rammula, R, Maendar, H, Aarik, J, Hudec, B, Husekova, K, Frohlich, K

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Atomic layer deposition of rutile-phase TiO sub(2) on RuO sub(2) from TiCl sub(4) and O sub(3): Growth of high-permittivity dielectrics with low leakage current by Aarik, J, Arroval, T, Aarik, L, Rammula, R, Kasikov, A, Maendar, H, Hudec, B, Husekova, K, Froehlich, K

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Impact of plasma treatment on electrical properties of TiO sub(2)/RuO sub(2) based DRAM capacitor by Hudec, B, Husekova, K, Rosova, A, Soltys, J, Rammula, R, Kasikov, A, Uustare, T, Micusik, M, Omastova, M, Aarik, J, Froehlich, K

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Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer by Hudec, B., Hušeková, K., Dobročka, E., Aarik, J., Rammula, R., Kasikov, A., Tarre, A., Vincze, A., Fröhlich, K.

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TiO2-Based Metal-Insulator-Metal Structures for Future DRAM Storage Capacitors by Fröhlich, Karol, Hudec, Boris, Ťapajna, Milan, Hušeková, Kristina, Rosová, Alica, Eliáš, Peter, Aarik, Jaan, Rammula, Raul, Kasikov, Aarne, Arroval, Tonis, Aarik, Lauri, Murakami, Katsuhisa, Rommel, Mathias, Bauer, Anton J.

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Effects of precursors on nucleation in atomic layer deposition of HfO2 by AARIK, Jaan, AIDLA, Aleks, KIKAS, Arvo, KÄÄMBRE, Tanel, RAMMULA, Raul, RITSLAID, Peeter, UUSTARE, Teet, SAMMELSELG, Väino

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Structural characterization of TiO 2 –Cr 2 O 3 nanolaminates grown by atomic layer deposition by Sammelselg, V., Tarre, A., Luo, Jun, Aarik, J., Niilisk, A., Uustare, T., Netsipailo, I., Rammula, R., Parna, R., Rosental, A.

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Structural characterization of TiO 2–Cr 2O 3 nanolaminates grown by atomic layer deposition by Sammelselg, V., Tarre, A., Lu, J., Aarik, J., Niilisk, A., Uustare, T., Netšipailo, I., Rammula, R., Pärna, R., Rosental, A.

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XPS and AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon by Sammelselg, V., Rammula, R., Aarik, J., Kikas, A., Kooser, K., Käämbre, T.

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Effect of phase composition on X-ray absorption spectra of ZrO2 thin films by Kikas, A., Aarik, J., Kisand, V., Kooser, K., Käämbre, T., Mändar, H., Uustare, T., Rammula, R., Sammelselg, V., Martinson, I.

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Effect of phase composition on X-ray absorption spectra of ZrO 2 thin films by Kikas, A., Aarik, J., Kisand, V., Kooser, K., Käämbre, T., Mändar, H., Uustare, T., Rammula, R., Sammelselg, V., Martinson, I.

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Atomic layer deposition of aluminum oxide films on graphene by Rammula, Raul, Aarik, Lauri, Kasikov, Arne, Kozlova, Jekaterina, Kahro, Tauno, Matisen, Leonard, Niilisk, Ahti, Alles, Harry, Aarik, Jaan

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