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Plasma Etching Endpoint Detection in the Presence of Chamber Variations Through Nonlinear Manifold Learning and Density-Based Clustering
by
Sun Kim, Chae
,
Rang Roh, Hae
,
Lee, Yongseok
,
Park, Taekyoon
,
Lee, Chanmin
,
Min Lee, Jong
Published in
IEEE transactions on semiconductor manufacturing
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Improvement of Plasma Etching Endpoint Detection with Data-driven Wavelength Selection and Gaussian Mixture Model
by
Kim, Chae Sun
,
Lee, Hye Ji
,
Roh, Hae Rang
,
Park, Taekyoon
,
Lee, Yongseok
,
Han, Jewoo
,
Kwon, Sungun
,
Lee, Chanmin
,
Sun, Jongwoo
,
Yoon, Kukhan
,
Lee, Jong Min
Published in
IEEE transactions on semiconductor manufacturing
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TabNet-based Self-supervised Fault Diagnosis in Multivariate Time-series Process Data without Labels
by
Roh, Hae Rang
,
Lee, Jong Min
Published in
IFAC-PapersOnLine
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TabNet-based Self-supervised Fault Diagnosis in Multivariate Time-series Process Data without Labels⁎⁎This work was financially supported by Samsung Electronics Co., Ltd
by
Roh, Hae Rang
,
Lee, Jong Min
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IFAC-PapersOnLine
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Ieee Transactions On Semiconductor Manufacturing
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Ifac-Papersonline
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Science & Technology
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Technology
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Endpoint Detection
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Engineering
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Engineering, Electrical & Electronic
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Engineering, Manufacturing
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Etching
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Optical Emission Spectroscopy
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Physical Sciences
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Physics
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Physics, Applied
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Physics, Condensed Matter
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Plasma Etching
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Plasmas
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Principal Component Analysis
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Training Data
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Algorithms
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Automation & Control Systems
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Chamber Variation
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Bacon - Elsevier - Global Sciencedirect-Openaccess
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