Real space soft x-ray imaging at 10 nm spatial resolution by Chao, W, Fischer, P, Tyliszczak, T, Rekawa, S, Anderson, E, Naulleau, P

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Demonstration of 12 nm resolution Fresnel zone plate lens based soft x-ray microscopy by Chao, Weilun, Kim, Jihoon, Rekawa, Senajith, Fischer, Peter, Anderson, Erik H

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Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy by KLEINEBERG, U, HAINDL, G, HÜTTEN, A, REISS, G, GULLIKSON, E. M, JONES, M. S, MROWKA, S, REKAWA, S. B, UNDERWOOD, J. H

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Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography by Naulleau, Patrick P, Goldberg, Kenneth A, Batson, Phil, Bokor, Jeffrey, Denham, Paul, Rekawa, Senajith

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Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic by Naulleau, Patrick P., Goldberg, Kenneth A., Anderson, Erik, Cain, Jason P., Denham, Paul, Jackson, Keith, Morlens, Anne-Sophie, Rekawa, Seno, Salmassi, Farhad

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A design study for synchrotron-based high-numerical-aperture scanning illuminators by Naulleau, Patrick P, Denham, Paul E, Hoef, Brian, Rekawa, Senajith

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Design and implementation of a vacuum-compatible laser-based subnanometer-resolution absolute distance measurement system by Naulleau, Patrick P, Denham, Paul E, Rekawa, Senajith

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Hartmann wave-front measurement at 13.4 nm with EUV/120 accuracy by Mercere,P., Zeitounn, P., Idir, M., Le Pape, S., Douillet, D., Leveq, X., Dovilliare, G., Bucourt, S., Goldberg, K., Naulleau, P., Rekawa, S.

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At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic by Naulleau, Patrick, Goldberg, Kenneth A., Anderson, Erik H., Batson, Phillip, Denham, Paul E., Jackson, Keith H., Gullikson, Eric M., Rekawa, Senajith, Bokor, Jeffrey

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A Synchrotron-Based Fourier-Synthesis Custom-Coherence Illuminator by Naulleau, Patrick P, Goldberg, Kenneth A, Batson, Phil, Denham, Paul, Rekawa, Senajith

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At-Wavelength Interferometry of High-NA Diffraction-Limited EUV Optics by Goldberg, Kenneth A, Naulleau, Patrick, Rekawa, Senajith, Denham, Paul, Liddle, J Alexander, Anderson, Erik, Jackson, Keith, Bokor, Jeffrey, Attwood, David

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Coherent Soft X-ray Branchline at the Advanced Light Source by Rosfjord, Kristine, Kemp, Charles, Denham, Paul, Gullikson, Eric, Batson, Phillip, Rekawa, Senajith, Attwood, David

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X ray Wavefront Hartmann Sensor by Mercere, Pascal, Idir, Mourad, Zeitoun, Philippe, Levecq, Xavier, Dovillaire, Guillaume, Bucourt, Samuel, Douillet, Denis, Goldberg, Kenneth A, Naulleau, Patrick P, Rekawa, Senajith

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Characterization of thermal distortion effects on beamline optics for EUV interferometry and soft x‐ray microscopy by Beguiristain, R., Underwood, J. H., Koike, M., Batson, P., Medecki, H., Rekawa, S., Jackson, K., Attwood, D.

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Characterization of thermal distortion effects on beamline optics for EUV interferometry and soft x-ray microscopy by Beguiristain, H. Raul, Underwood, James H., Koike, Masato, Batson, Phillip J., Medecki, Hector, Rekawa, S., Jackson, Keith H., Attwood, David T.

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Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture by Goldberg, K. A., Naulleau, P., Mochi, I., Anderson, E. H., Rekawa, S. B., Kemp, C. D., Gunion, R. F., Han, H.-S., Huh, S.

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Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture by Goldberg, K. A., Naulleau, P., Mochi, I., Anderson, E. H., Rekawa, S. B., Kemp, C. D., Gunion, R. F., Han, H.-S., Huh, S.

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Characterization of extreme ultraviolet lithography mask defects from extreme ultraviolet far-field scattering patterns by Yi, Moonsuk, Jeong, Seongtae, Rekawa, Seno, Bokor, Jeffrey

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Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic by Naulleau, Patrick, Goldberg, Kenneth A., Anderson, Erik H., Attwood, David, Batson, Phillip, Bokor, Jeffrey, Denham, Paul, Gullikson, Eric, Harteneck, Bruce, Hoef, Brian, Jackson, Keith, Olynick, Deirdre, Rekawa, Seno, Salmassi, Farhad, Blaedel, Ken, Chapman, Henry, Hale, Layton, Mirkarimi, Paul, Soufli, Regina, Spiller, Eberhard, Sweeney, Don, Taylor, John, Walton, Chris, O’Connell, Donna, Tichenor, Daniel, Gwyn, Charles W., Yan, Pei-Yang, Zhang, Guojing

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At-wavelength alignment and testing of the 0.3 NA MET optic by Goldberg, Kenneth A., Naulleau, Patrick P., Denham, Paul E., Rekawa, Senajith B., Jackson, Keith, Anderson, Erik H., Liddle, J. Alexander

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