Search Results - Ruela, Lucas M

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    Optimizing Josephson Junction Reproducibility in 30 kV E-Beam Lithography: An Analysis of Backscattered Electron Distribution

    Optimizing Josephson Junction Reproducibility in 30 kV E-Beam Lithography: An Analysis of Backscattered Electron Distribution by Rebello, Arthur M, Ruela, Lucas M, Moreto, Gustavo, Klein, Naiara Y, Martins, Eldues, Oliveira, Ivan S, Sinnecker, João P, Rouxinol, Francisco

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