Investigation of change of the composition and structure of the CaF2/Si films surface at the low-energy bombardment by Umirzakov, B.E., Tashmukhamedova, D.A., Ruzibaeva, M.K., Djurabekova, F.G., Danaev, S.B.

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Effect of the [O.sup.+.sub.2]-ion bombardment on the TiN composition and structure by Isakhanov, Z.A, Umirzakov, Yu. E, Ruzibaeva, M.K, Donaev, S.B

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Analysis of profiles of atomic distribution over the depth of Si-Me free nanofilm systems by Umirzakov, B. E., Isakhanov, Z. A., Ruzibaeva, M. K., Mukhtarov, Z. E., Khalmatov, A. S.

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Analysis of the structure and properties of heterostructured nanofilms prepared by epitaxy and ion implantation methods by Umirzakov, B. E., Tashmukhamedova, D. A., Ruzibaeva, M. K., Tashatov, A. K., Donaev, S. B., Mavlyanov, B. B.

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Optimum ion implantation and annealing conditions for stimulating secondary negative ion emission by Isakhanov, Z. A., Mukhtarov, Z. E., Umirzakov, B. E., Ruzibaeva, M. K.

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Stimulation of secondary negative ion emission by implantation of alkaline ions into the surface layer of a solid followed by heating by Aliev, A. A., Isakhanov, Z. A., Mukhtarov, Z. E., Ruzibaeva, M. K.

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The comparative investigation of spectra of characteristic energy losses of electrons reflected from the surface of semiconductors and their alloys by Aliev, A.A., Ruzibaeva, M.K., Kim, A.E.

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