Search Results - Ryoo, Man-Hyoung

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  1. 1
    Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography

    Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography by Hata, Mitsuhiro, Ryoo, Man-Hyoung, Choi, Sang-Jun, Cho, Han-Ku

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  2. 2
    Dissolution Enhancement of Immersion Barrier Coat by Post Exposure Bake

    Dissolution Enhancement of Immersion Barrier Coat by Post Exposure Bake by Hata, Mitsuhiro, Kim, Hyun-Woo, Yoon, Jin-Young, Ha, Jung-Hwan, Ryoo, Man-Hyoung, Woo, Sang-Gyun, Cho, Han-Ku

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  3. 3
    Chemical shrinkage material: Nanoscale patterning through interpolymer complex

    Chemical shrinkage material: Nanoscale patterning through interpolymer complex by Hata, Mitsuhiro, Hah, Jung-Hwan, Kim, Hyun-Woo, Ryoo, Man-Hyoung, Choi, Sang-Jun, Woo, Sang-Gyun, Cho, Han-Ku

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  4. 4
    Photoacoustic study on the structural transformation of AlPO4-21/AlPO4-25 and AlPO4–H3/AlPO4 –C/AlPO4–D

    Photoacoustic study on the structural transformation of AlPO4-21/AlPO4-25 and AlPO4–H3/AlPO4 –C/AlPO4–D by Ryoo, Man-Hyoung, Chon, Hakze

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  5. 5
    The characterization of Co(saloph) complexes encapsulated into VPI-5 and AlPO4-8

    The characterization of Co(saloph) complexes encapsulated into VPI-5 and AlPO4-8 by Ryoo, Man-Hyoung, Chon, Hakze

    Published in Microporous materials
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  6. 6
    Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer

    Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer by Lee, Byoung Taek, Hoshino, Eiichi, Takahashi, Masashi, Yoneda, Takashi, Yamanashi, Hiromasa, Hoko, Hiromasa, Ryoo, ManHyoung, Chiba, Akira, Ito, Masaaki, Sugawara, Minoru, Ogawa, Tarou, Okazaki, Sinji

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  7. 7
    The characterization of Co(saloph) complexes encapsulated into VPI-5 and AlPO 4-8

    The characterization of Co(saloph) complexes encapsulated into VPI-5 and AlPO 4-8 by Ryoo, Man-Hyoung, Chon, Hakze

    Published in Microporous materials
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  8. 8
    Chemical shrinkage material: Nanoscale patterning throughinterpolymer complex

    Chemical shrinkage material: Nanoscale patterning throughinterpolymer complex by Hata, Mitsuhiro, Hah, Jung-Hwan, Kim, Hyun-Woo, Ryoo, Man-Hyoung, Choi, Sang-Jun, Woo, Sang-Gyun, Cho, Han-Ku

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