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Multiple independent gate field effect transistors : Device, process, applications
by
MATHEW, Leo
,
SADD, Michael
,
ZANG, W
,
CHOWDHRY, Murshed M
,
FOSSUM, Jerry G
,
THEAN, Aaron
,
STEPHENS, Tab
,
MORA, Rode
,
ZAVALA, Melissa
,
NGUYEN, Bichyen
,
RAI, Raghaw
,
BACKER, Susan
,
SHIMER, Rob
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Poly-Si gate CMOS with hafnium silicate gate dielectric
by
HOBBS, Christopher
,
GRANT, John
,
FRANKE, Andrea
,
GARCIA, Ricardo
,
HEBERT, Liz
,
AZRAK, Marijean
,
SING, David
,
STEPHENS, Tab
,
SCROGUM, Carl
,
RAI, Raghaw
,
BECNEL, Virginia
,
CONNER, Jim
,
KHER, Shreyas
,
WHITE, Bruce
,
TOBIN, Phil
,
DHANDAPANI, Veer
,
TAYLOR, Bill
,
DIP, Lurae
,
HEGDE, Rama
,
METZNER, Craig
,
HSING TSENG
,
GILMER, David
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A comparison of via overetch variations between conventional Al-W and dual-inlaid copper integrations
by
Smith, B.
,
Blackley, S.
,
Carter, R.
,
Chheda, S.
,
Crabtree, P.
,
Farber, D.
,
Gall, M.
,
Islam, R.
,
Jawarani, D.
,
King, C.
,
Menke, D.
,
Nelson, R.
,
Pressley, L.
,
Smith, D.
,
Sparks, T.
,
Stephens, T.
,
Travis, E.
,
Venkatesan, S.
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Conference Proceedings
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Applied Sciences
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Electronics
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Exact Sciences And Technology
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Semiconductor Electronics. Microelectronics. Optoelectronics. Solid State Devices
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Design. Technologies. Operation Analysis. Testing
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Integrated Circuits
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Transistors
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Aluminum
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Artificial Intelligence
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Copper
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Dielectrics
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Etching
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Integrated Circuit Interconnections
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Metallization, Contacts, Interconnects; Device Isolation
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Microelectronic Fabrication
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Microelectronics: Lsi, Vlsi, Ulsi; Integrated Circuit Fabrication Technology
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Random Processes
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Thickness Control
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Thickness Measurement
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Tungsten
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Institute Of Physics Iopscience Extra
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Ieee Electronic Library (Iel) Conference Proceedings
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