Search Results - SUNGAUER, E

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  1. 1
    Plasma etching of HfO2 in metal gate CMOS devices

    Plasma etching of HfO2 in metal gate CMOS devices by SUNGAUER, E, MELLHAOUI, X, PARGON, E, JOUBERT, O

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  2. 2
    Plasma etching of HfO@@d2@ in metal gate CMOS devices

    Plasma etching of HfO@@d2@ in metal gate CMOS devices by Sungauer, E, Mellhaoui, X, Pargon, E, Joubert, O

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  3. 3
    Plasma etching of HfO 2 in metal gate CMOS devices

    Plasma etching of HfO 2 in metal gate CMOS devices by Sungauer, E., Mellhaoui, X., Pargon, E., Joubert, O.

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  4. 4
    Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas

    Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas by Sungauer, E., Pargon, E., Mellhaoui, X., Ramos, R., Cunge, G., Vallier, L., Joubert, O., Lill, T.

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  5. 5
    Etching mechanisms of Hf O 2 , Si O 2 , and poly-Si substrates in B Cl 3 plasmas

    Etching mechanisms of Hf O 2 , Si O 2 , and poly-Si substrates in B Cl 3 plasmas by Sungauer, E., Pargon, E., Mellhaoui, X., Ramos, R., Cunge, G., Vallier, L., Joubert, O., Lill, T.

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