Search Results - Sahafi, H.F.

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    The effect of process parameters on dc self-bias voltage in reactive ion etching of GaAs using CH4/H2

    The effect of process parameters on dc self-bias voltage in reactive ion etching of GaAs using CH4/H2 by Sahafi, H.F., Webb, A.P., Carter, M.A., Goldspink, G.F.

    Published in Microelectronics
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