Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter by Osugi, Masafumi, Tanaka, Kazuumi, Sakaya, Noriyuki, Hamamoto, Kazuhiro, Watanabe, Takeo, Kinoshita, Hiroo

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Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU by Watanabe, Takeo, Kinoshita, Hiroo, Sakaya, Noriyuki, Shoki, Tsutomu, Lee, Seung Yoon

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Direct Evaluation of Surface Roughness of Substrate and Interfacial Roughness in Molybdenum/Silicon Multilayers Using Extreme Ultraviolet Reflectometer by Hosoya, Morio, Sakaya, Noriyuki, Nozawa, Osamu, Shiota, Yuki, Shimojima, Shoji, Shoki, Tsutomu, Watanabe, Takeo, Kinoshita, Hiroo

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Evaluating the Optical Index of Ta and Ta-Based Absorbers for an Extreme Ultraviolet Mask Using Extreme Ultraviolet Reflectometry by Hosoya, Morio, Sakaya, Noriyuki, Nozawa, Osamu, Shiota, Yuki, Hamamoto, Kazuo, Nagarekawa, Osamu, Shimojima, Shoji, Shoki, Tsutomu, Watanabe, Takeo, Kinoshita, Hiroo

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Actinic Mask Inspection Using an EUV Microscope –Preparation of a Mirau Interferometer for Phase-Defect Detection by Hamamoto, Kazuhiro, Tanaka, Yuzuru, Kawashima, Hirotake, Lee, Seung Yoon, Hosokawa, Nobuyuki, Sakaya, Noriyuki, Hosoya, Morio, Shoki, Tsutomu, Watanabe, Takeo, Kinoshita, Hiroo

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Investigation of Contamination Removal from Finished EUVL Mask by Hamamoto, Kazuhiro, Takada, Shintaro, Watanabe, Takeo, Sakaya, Noriyuki, Shoki, Tsutomu, Hosoya, Morio, Kinoshita, Hiroo

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Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes by Hosokawa, Nobuyuki, Watanabe, Takeo, Sakaya, Noriyuki, Shoki, Tsutomu, Hamamoto, Kazuhiro, Kinoshita, Hiroo

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Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation by Hamamoto, Kazuhiro, Tanaka, Yuzuru, Watanabe, Takeo, Sakaya, Noriyuki, Hosoya, Morio, Shoki, Tsutomu, Sugahara, Hiroshi, Hishinuma, Nobuyuki, Hada, Hideo, Kinoshita, Hiroo

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Prepulse Effect for Recombining Plasma Produced by Ultrashort High-Intensity Lasers by Woo Choi, Il, A. Tanaka, Hiroyuki Daido, Kunioki Mima, Kunioki Mima

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Cleaning Characteristics of Contaminated Imaging Optics Using 172 nm Radiation by Tanaka, Kazuumi, Hamamoto, Kazuhiro, Sakaya, Noriyuki, Hosoya, Morio, Watanabe, Takeo, Kinoshita, Hiroo

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Investigation of soft X-ray emission from a gas puff target irradiated with a Nd:YAG laser by Fiedorowicz, Henryk, Bartnik, Andrzej, Szczurek, Mirosław, Daido, Hiroyuki, Sakaya, Noriyuki, Kmetik, Viliam, Kato, Yoshiaki, Suzuki, Masayuki, Matsumura, Masai, Tajima, Junichi, Nakayama, Takeyoshi, Wilhein, Thomas

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Phase Defect Observation Using Extreme Ultraviolet Microscope by Hamamoto, Kazuhiro, Tanaka, Yuzuru, Yoshizumi, Takahiro, Hosokawa, Nobuyuki, Sakaya, Noriyuki, Hosoya, Morio, Shoki, Tsutomu, Watanabe, Takeo, Kinoshita, Hiroo

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Actinic Mask Inspection using EUV Microscope by Kinoshita, Hiroo, Hamamoto, Kazuhiro, Tanaka, Yuzuru, Sakaya, Noriyuki, Hosoya, Morio, Shoki, Tsutomu, Lee, Donggun, Watanabe, Takeo

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Evaluation method of Optical Index of Ta and Ta-based absorber for EUV mask Using Extreme Ultraviolet Reflectometer by Hosoya, Morio, sakaya, Noriyuki, Nozawa, Osamu, Hamamoto, Kazuo, Nagarekawa, Osamu, Watanabe, Takeo, Kinoshita, Hiroo

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Resolution enhancement of EUV microscope using an EUV beam splitter by Osugi, Masafumi, Tanaka, Kazuumi, Sakaya, Noriyuki, Hamamoto, Kazuhiro, Watanabe, Takeo, Kinoshita, Hiroo

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Damage-free extreme ultraviolet mask with TaBN absorber by Shoki, Tsutomu, Kinoshita, Takeru, Sakaya, Noriyuki, Hosoya, Morio, Ohkubo, Ryo, Usui, Yoh-ich, Kobayashi, Hideo, Nagarekawa, Osamu

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Novel evaluation system for EUV resist in NewSUBARU by Seung Yoon Lee, Watanabe, T., Kinoshita, H., Sakaya, N., Shoki, T.

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Phase defect observation using an EUV microscope by Hamamoto, K., Tanaka, Y., Hosokawa, N., Sakaya, N., Hosoya, M., Shoki, T., Watanabe, T., Kinoshita, H.

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Development of the optical component for EUV phase-shift microscopes by Hosokawa, N., Watana, T., Tsutomu, N., Hamamoto, K., Kinoshita, H.

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Actinic mask inspection using EUV microscope by Harnamoto, K., Tanaka, Y., Kawashima, H., Seung Yoon Lee, Hosokawa, N., Sakaya, N., Hosoya, M., Shoki, T., Watanabe, T., Kinoshita, H.

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