Organic Mask Removal Assessment for 32nm Fully Depleted SOI Technology with TiN-metal Gate on HfO2 by Lachal, Laurent, Chiaroni, Julien, Lajoinie, Emile, Louveau, Olivier, Ritton, Frederic, Lavios, Pascal, Finet, Jean-Marc, Biranceau, Pierre, Arnoux, André, Sauvagnargues, Eric, Bailloux, Olivier, Medico, Gino, Tallaron, Christiane, Humbert, Franck, Rochat, Névine, Martinez, Eugenie

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