Search Results - Seo, Rabul

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  1. 1
    Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production

    Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production by Park, Seolhye, Park, Yoona, Seong, Jaegu, Lee, Haneul, Bae, Namjae, Roh, Ki-baek, Seo, Rabul, Song, Bongsub, Kim, Gon-Ho

    Published in Physics of plasmas
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  2. 2
    Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM

    Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM by Park, Seolhye, Jang, Yongsuk, Cha, Taewon, Noh, Yeongil, Choi, Younghoon, Lee, Juyoung, Seong, Jaegu, Kim, Byungsoo, Cho, Taeyoung, Park, Yoona, Seo, Rabul, Yang, Jae-Ho, Kim, Gon-Ho

    Published in Physics of plasmas
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  3. 3
    Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing

    Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing by Park, Seolhye, Kyung, Yunyoung, Lee, Juyoung, Jang, Yongsuk, Cha, Taewon, Noh, Yeongil, Choi, Younghoon, Kim, Byungsoo, Cho, Taeyoung, Seo, Rabul, Yang, Jae‐Ho, Jang, Yunchang, Ryu, Sangwon, Kim, Gon‐Ho

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  4. 4
    Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM

    Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM by Park, Seolhye, Seong, Jaegu, Park, Yoona, Noh, Yeongil, Lee, Haneul, Bae, Namjae, Roh, Ki-Baek, Seo, Rabul, Song, Bongsub, Kim, Gon-Ho

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