An atomic level study of multiple co-implantation technology for 32nm and beyond pMOSFETs ultra-shallow junction by Yun-Ju Sun, Ya-Yun Cheng, Yin-Pin Wang, Yamamoto, Tomonari, Chun-Fu Cheng, Shao-Hwang Sia, Yu-Chia Chang, Yueh-You Chen, Ching-Wei Tsai, Yi-Ming Sheu, Wang, Howard C.-H

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