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    Recent Advances in the Design of Resist Materials for 157 nm Lithography

    Recent Advances in the Design of Resist Materials for 157 nm Lithography by Houlihan, Francis, Sakamuri, Raj, Romano, Andrew, Rentkiewicz, David, Dammel, Ralph, Stephanko, Nickolay, Market, M., Vermeir, U. Mierau Inge, Hohle, Christoph, Conley, Sill, Miller, Daniel, Itani, Toshiro, Shigematus, Masato, Kawaguchi, Etsuo

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