Search Results - Shin, Hyun Koock

  • Showing 1 - 5 results of 5
Refine Results
  1. 1
    Influence of the deposition temperature on the properties of copper thin films prepared by alternating injection of Cu(ethylketoiminate)2 and H2 on a ruthenium substrate

    Influence of the deposition temperature on the properties of copper thin films prepared by alternating injection of Cu(ethylketoiminate)2 and H2 on a ruthenium substrate by PARK, Kwang-Min, KIM, Jae-Kyung, HAN, Byeol, LEE, Won-Jun, KIM, Jinsik, SHIN, Hyun-Koock

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  2. 2
    Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies

    Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies by Seo, Seung-Ho, Shin, Donggeon, Kim, Cha-Hee, Jeong, Keun-Tae, Lee, Yeongjong, Kim, Daehyun, Shin, Hyun Koock, Lee, Won-Jun

    Get full text
    Article
    Save to List
    Saved in:
  3. 3
    Influence of the deposition temperature on the properties of copper thin films prepared by alternating injection of Cu(ethylketoiminate) sub(2 and H) sub(2) on a ruthenium substrate

    Influence of the deposition temperature on the properties of copper thin films prepared by alternating injection of Cu(ethylketoiminate) sub(2 and H) sub(2) on a ruthenium substrat... by Park, Kwang-Min, Kim, Jae-Kyung, Han, Byeol, Lee, Won-Jun, Kim, Jinsik, Shin, Hyun-Koock

    Get full text
    Article
    Save to List
    Saved in:
  4. 4
    Influence of the deposition temperature on the properties of copper thin films prepared by alternating injection of Cu(ethylketoiminate) 2 and H 2 on a ruthenium substrate

    Influence of the deposition temperature on the properties of copper thin films prepared by alternating injection of Cu(ethylketoiminate) 2 and H 2 on a ruthenium substrate by Park, Kwang-Min, Kim, Jae-Kyung, Han, Byeol, Lee, Won-Jun, Kim, Jinsik, Shin, Hyun-Koock

    Get full text
    Article
    Save to List
    Saved in:
  5. 5
    A noble metallization process using Preferential Metal Deposition (PMD)-aluminum with methylpyrroridine alane (MPA)

    A noble metallization process using Preferential Metal Deposition (PMD)-aluminum with methylpyrroridine alane (MPA) by Jong Myeong Lee, Byung Hee Kim, Ju Young Yun, Myoung Bum Lee, Gil Heyun Choi, Young Wook Park, Hyun Koock Shin, Sang In Lee, Joo Tae Moon

    Request full text
    Conference Proceeding
    Save to List
    Saved in:

Search Tools: