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Search Results - Shirayone, Shigeru
Search Results - Shirayone, Shigeru
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Particle Transport in Etching Chamber Influenced by Coulomb Force
by
Ishiguro, Masaki
,
Ikenaga, Kazuyuki
,
Tamura, Tomoyuki
,
Shirayone, Shigeru
,
Nawata, Makoto
,
Sumiya, Masahiro
Published in
IEEE transactions on semiconductor manufacturing
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Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region
by
Matsuzawa, Nobuyuki N.
,
Oizumi, Hiroaki
,
Mori, Shigeyasu
,
Irie, Shigeo
,
Shirayone, Shigeru
,
Yano, Ei
,
Okazaki, Shinji
,
Ishitani, Akihiko
,
Dixon, David A.
Published in
Japanese Journal of Applied Physics
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Evaluation of the Outgassing from Resists at the EUV Wavelength
by
Irie, Shigeo
,
Oizumi, Hiroaki
,
Nishiyama, Iwao
,
Shirayone, Shigeru
,
Ryoo, Manhyoung
,
Yamanashi, Hiromasa
,
Yano, Ei
,
Okazaki, Shinji
Published in
Journal of Photopolymer Science and Technology
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Development of Resist Materials for EUVL
by
Irie, Shigeo
,
Shirayone, Shigeru
,
Mori, Shigeyasu
,
Oizumi, Hiroaki
,
Matsuzawa, Nobuyuki
,
Yano, Ei
,
Okazaki, Shinji
,
Watanabe, Takeo
,
Kinoshita, Hiroo
Published in
Journal of Photopolymer Science and Technology
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Imaging results for resist films exposed to EUV radiation
by
Ryoo, Manhyoung
,
Shirayone, Shigeru
,
Yano, Ei
,
Okazaki, Shinji
,
Kang, Sujin
Published in
Microelectronic engineering
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Illumination system design for a three-aspherical-mirror projection camera for extreme-ultraviolet lithography
by
Li, Y
,
Kinoshita, H
,
Watanabe, T
,
Irie, S
,
Shirayone, S
,
Okazaki, S
Published in
Applied optics (2004)
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Prediction of resolution using wet-develop type single layer and dry-development process for EUV lithography
by
Mori, Shigeyasu
,
Shirayone, Shigeru
,
Irie, Shigeo
,
Matsuzawa, Nobuyuki
,
Oizumi, Hiroaki
,
Yano, Ei
,
Okazaki, Shinji
,
Miyafuji, Atsushi
,
Watanabe, Takeo
,
Kinoshita, Hiroo
,
Oshio, Tetsuya
,
Sugisaki, Katsumi
Published in
Microelectronic engineering
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