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e-beam metrology of thin resist for high NA EUVL
by
Lorusso, Gian Francesco
,
De Simone, Danilo
,
Zidan, Mohamed
,
Severi, Joren
,
Moussa, Alain
,
Dey, Bappaditya
,
Halder, Sandip
,
Goldenshtein, Alex
,
Houchens, Kevin
,
Santoro, Gaetano
,
Fischer, Daniel
,
Muellender, Angelika
,
Mack, Chris
,
Kondo, Tsuyoshi
,
Shohjoh, Tomoyasu
,
Ikota, Masami
,
Charley, Anne-Laure
,
De Gendt, Stefan
,
Leray, Philippe
Published in
Japanese Journal of Applied Physics
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Journal Title
Japanese Journal Of Applied Physics
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Subjects
Cd Sem
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Depth Of Field
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E-Beam
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Electron Beams
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Film Thickness
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High Na Euvl
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Metrology
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Numerical Aperture
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Physical Sciences
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Physics
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Physics, Applied
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Reduction
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Scanning Electron Microscopy
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Science & Technology
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Thin Resist
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Institute Of Physics Iopscience Extra
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