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Effect of hydrogen radical exposure on the interfacial and bulk structure of a-Si:H/a-SiNx:H multilayer films
by
Han, Gaorong
,
Du, Piyi
,
Shou, Jinhun
,
Zhao, Danmei
Published in
Thin solid films
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Thin Solid Films
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Chemical Vapor Deposition
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Condensed Matter: Structure, Mechanical And Thermal Properties
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Cross-Disciplinary Physics: Materials Science; Rheology
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Exact Sciences And Technology
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Hydrogen Radical
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Interface
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Low-Dimensional Structures : Structure, And Nonelectronic Properties
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Materials Science
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Materials Science, Coatings & Films
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Materials Science, Multidisciplinary
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Methods Of Deposition Of Films And Coatings; Film Growth And Epitaxy
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Multilayer Film
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Physical Sciences
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Physics
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Physics, Applied
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Physics, Condensed Matter
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Science & Technology
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Structure
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Surfaces And Interfaces; Thin Films And Whiskers
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Backfile Package - Materials Science [Yms]
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Backfile Package - Physics General (Legacy) [Ypa]
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