Pathway to sub-30nm Resolution in EUV Lithography by Thakerlay, James W., Nassar, Roger A., Spear-Alfonso, Kathleen, Brainard, Robert, Goldfarb, Dario, Wallow, Thomas, Wei, Yayi, Montgomery, Warren, Petrillo, Karen, Wood, Robert, Koay, Chief-seng, Mackey, Jeff, Naulleau, Patrick, Pierson, Bill, Solak, Harun H.

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Evaluation of High and Low Activation Resists for EUV Lithography by Thackeray, James W., Nassar, Roger A., Spear-Alfonso, Kathleen, Wallow, Tom, LaFontaine, Bruno

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Design Considerations for EUV Resist Materials by Thackeray, James W., Aqad, Emad, Kang, Su Jin, Spear-Alfonso, Kathleen

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Design of Faster High Resolution Resists: Getting More Acid Yield from EUV Photons by Thackeray, James W., Aqad, Emad, Cronin, Michael F., Spear-Alfonso, Kathaleen

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Polymer-Bound PAGs for EUV Lithography by Thackeray, James W., Aqad, Emad, Kang, Su Jin, Spear-Alfonso, Kathleen

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EUV Resists Designed for Low Acid Diffusion by Thackeray, James W, Aqad, Emad, Su Jin Kang, Spear-Alfonso, Kathleen

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